0.18 /spl mu/m CMOS技术，适用于高性能、低功耗和射频应用

1997 Symposium on VLSI Technology Pub Date : 1997-06-10 DOI:10.1109/VLSIT.1997.623671

T. C. Holloway, G. A. Dixit, D. T. Grider, S. P. Ashburn, Rajni Aggarwal, Albert Shih, Xin Zhang, George Misium, A. L. Esquivel, Manoj Jain, Sudhir Madan, Terence Breedijk, Abha Singh, Gautam Thakar, Greg Shinn, Bert Riemenschneider, Sean O’Brien, David Frystak, Jorge Kittl, A. Amerasekera, Shian Aur, Paul Nicollian, David Aldrich, Bob Eklund

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引用次数: 20

摘要

T. C. Holloway、G. A. Dixit、D. T. Grider、S. P. Ashburn、Rajni Aggarwal、Albert Shih、Xin Zhang、George Misium、A. L.Esquivel, Manoj Jain, Sudhir Madan, Terence Breedijk, Abha Singh, Gautam Thakar, Greg Shinn, Bert Riemenschneider, Sean O'Brien, David Frystak, Jorge Kittl, Ajith Amerasekera, Shian Aur, Paul Nicollian, David Aldrich, and Bob Eklund Semiconductor Process and Device Center (SPDC) Andrew Appel, Chris Bowles, and Tom Parrill Productization (PDZ) Texas Instruments Inc.美国德克萨斯州达拉斯市

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0.18 /spl mu/m CMOS Technology For High-performance, Low-power, And RF Applications

T. C. Holloway, G. A. Dixit, D. T. Grider, S. P. Ashburn, Rajni Aggarwal, Albert Shih, Xin Zhang, George Misium, A. L. Esquivel, Manoj Jain, Sudhir Madan, Terence Breedijk, Abha Singh, Gautam Thakar, Greg Shinn, Bert Riemenschneider, Sean O’Brien, David Frystak, Jorge Kittl, Ajith Amerasekera, Shian Aur, Paul Nicollian, David Aldrich, and Bob Eklund Semiconductor Process and Device Center (SPDC) Andrew Appel, Chris Bowles, and Tom Parrill Productization (PDZ) Texas Instruments Inc. Dallas, Texas, USA

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