MEMS x射线光学系统的x射线反射率评估

I. Mitsuishi, Y. Ezoe, M. Koshiishi, M. Mita, Y. Maeda, N. Yamasaki, K. Mitsuda, T. Shirata, T. Hayashi, T. Takano, R. Maeda
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引用次数: 2

摘要

在0.28 keV和1.49 keV两种不同能量下,测量了采用MEMS技术的超轻型x射线光学器件的x射线反射率。得到的反射率可以通过考虑镜面结构来理解。
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Evaluation of X-ray reflectivity of a MEMS X-ray optic
X-ray reflectivity of an ultra light-weight X-ray optic using MEMS technologies was measured in two different energies (0.28 keV and 1.49 keV). The obtained reflectivities can be understood by considering the mirror surface structures.
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