J. Dura, S. Martinie, D. Munteanu, F. Triozon, S. Barraud, Y. Niquet, J. Barbe, J. Autran
{"title":"含频带结构效应的GAA纳米线MOSFET弹道电流解析模型:在环形振荡器中的应用","authors":"J. Dura, S. Martinie, D. Munteanu, F. Triozon, S. Barraud, Y. Niquet, J. Barbe, J. Autran","doi":"10.1109/ULIS.2011.5758018","DOIUrl":null,"url":null,"abstract":"Gate-All-Around (GAA) nanowire architecture is aimed to represent the ultimate integration for MOSFET up to dimensions of several nanometers. Very thin nanowires (< 5 nm) are expected to be used in these ultimate devices, for which a new physical phenomenon emerges: the modification of the band structure compared to bulk silicon, which changes the conduction properties and affects the device characteristics. These band structure effects (BSE) are then expected to influence the performances of circuits based on ultra-thin nanowire GAA MOSFETs. In this paper, an analytical model for ballistic current in GAA nanowire MOSFET including the band structure variation is developed to assess the BSE impact on nanowire MOSFET operation. Results at the device level are successfully confronted and validated on numerical tight-binding simulations. The model is further implemented in a circuit simulator and is used to evaluate BSE impact on performances of ring oscillator based on GAA nanowire MOSFET.","PeriodicalId":146779,"journal":{"name":"Ulis 2011 Ultimate Integration on Silicon","volume":"55 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2011-03-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Analytical model of ballistic current for GAA nanowire MOSFET including band structure effects: Application to ring oscillator\",\"authors\":\"J. Dura, S. Martinie, D. Munteanu, F. Triozon, S. Barraud, Y. Niquet, J. Barbe, J. Autran\",\"doi\":\"10.1109/ULIS.2011.5758018\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Gate-All-Around (GAA) nanowire architecture is aimed to represent the ultimate integration for MOSFET up to dimensions of several nanometers. Very thin nanowires (< 5 nm) are expected to be used in these ultimate devices, for which a new physical phenomenon emerges: the modification of the band structure compared to bulk silicon, which changes the conduction properties and affects the device characteristics. These band structure effects (BSE) are then expected to influence the performances of circuits based on ultra-thin nanowire GAA MOSFETs. In this paper, an analytical model for ballistic current in GAA nanowire MOSFET including the band structure variation is developed to assess the BSE impact on nanowire MOSFET operation. Results at the device level are successfully confronted and validated on numerical tight-binding simulations. The model is further implemented in a circuit simulator and is used to evaluate BSE impact on performances of ring oscillator based on GAA nanowire MOSFET.\",\"PeriodicalId\":146779,\"journal\":{\"name\":\"Ulis 2011 Ultimate Integration on Silicon\",\"volume\":\"55 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2011-03-14\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Ulis 2011 Ultimate Integration on Silicon\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ULIS.2011.5758018\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Ulis 2011 Ultimate Integration on Silicon","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ULIS.2011.5758018","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Analytical model of ballistic current for GAA nanowire MOSFET including band structure effects: Application to ring oscillator
Gate-All-Around (GAA) nanowire architecture is aimed to represent the ultimate integration for MOSFET up to dimensions of several nanometers. Very thin nanowires (< 5 nm) are expected to be used in these ultimate devices, for which a new physical phenomenon emerges: the modification of the band structure compared to bulk silicon, which changes the conduction properties and affects the device characteristics. These band structure effects (BSE) are then expected to influence the performances of circuits based on ultra-thin nanowire GAA MOSFETs. In this paper, an analytical model for ballistic current in GAA nanowire MOSFET including the band structure variation is developed to assess the BSE impact on nanowire MOSFET operation. Results at the device level are successfully confronted and validated on numerical tight-binding simulations. The model is further implemented in a circuit simulator and is used to evaluate BSE impact on performances of ring oscillator based on GAA nanowire MOSFET.