{"title":"通过向VDD和GND线提供脉冲电压信号的CMOS-LSI开路故障检测方法","authors":"H. Sumitomo, T. Nakamura","doi":"10.1109/IPFA.1997.638123","DOIUrl":null,"url":null,"abstract":"An easy and rapid failure analysis method to detect CMOS-LSI open faults has been developed. This method exploits both the properties of CMOS structure and the voltage contrast image. By supplying pulsed signal to VDD and GND, and observing the voltage contrast image, open faults appear different from the rest of the LSI. An image processing system is proposed which improves image observability and thereby decreases inspection time.","PeriodicalId":159177,"journal":{"name":"Proceedings of the 1997 6th International Symposium on the Physical and Failure Analysis of Integrated Circuits","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1997-07-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Open fault detection method for CMOS-LSI by supplying pulsed voltage signal to VDD and GND lines\",\"authors\":\"H. Sumitomo, T. Nakamura\",\"doi\":\"10.1109/IPFA.1997.638123\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"An easy and rapid failure analysis method to detect CMOS-LSI open faults has been developed. This method exploits both the properties of CMOS structure and the voltage contrast image. By supplying pulsed signal to VDD and GND, and observing the voltage contrast image, open faults appear different from the rest of the LSI. An image processing system is proposed which improves image observability and thereby decreases inspection time.\",\"PeriodicalId\":159177,\"journal\":{\"name\":\"Proceedings of the 1997 6th International Symposium on the Physical and Failure Analysis of Integrated Circuits\",\"volume\":\"1 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1997-07-21\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings of the 1997 6th International Symposium on the Physical and Failure Analysis of Integrated Circuits\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IPFA.1997.638123\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of the 1997 6th International Symposium on the Physical and Failure Analysis of Integrated Circuits","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IPFA.1997.638123","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Open fault detection method for CMOS-LSI by supplying pulsed voltage signal to VDD and GND lines
An easy and rapid failure analysis method to detect CMOS-LSI open faults has been developed. This method exploits both the properties of CMOS structure and the voltage contrast image. By supplying pulsed signal to VDD and GND, and observing the voltage contrast image, open faults appear different from the rest of the LSI. An image processing system is proposed which improves image observability and thereby decreases inspection time.
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