异质外延生长InP太阳能电池

I. Weinberg, C. K. Swartz, D. Brinker, D. Wilt
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引用次数: 3

摘要

采用OMCVD法分别在具有中间GaAs层的硅衬底(InP/GaAs/Si)和GaAs衬底(InP/GaAs)上制备的InP太阳能电池,在10-MeV质子辐照前后进行了性能测定。辐照前输运特性主要受InP-GaAs界面位错的影响。质子辐照量为1.1*10/sup 13/ cm/sup -2/时,载体去除率为1.8*10/sup 3/ cm/sup -1/。尽管缺陷的产生程度很高,但异质外延细胞的抗辐射能力明显高于单片n/sup +/p InP细胞。所观察到的低电池效率和高抗辐射能力是由于细胞p-碱基区位错的主要影响
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Heteroepitaxially grown InP solar cells
The properties of InP solar cells, processed by OMCVD on silicon substrates with an intermediate GaAs layer (InP/GaAs/Si) and on GaAs substrates (InP/GaAs), were determined before and after irradiation with 10-MeV protons. The preirradiation transport properties were found to be influenced largely by dislocations occurring at the InP-GaAs interface. A carrier removal rate of 1.8*10/sup 3/ cm/sup -1/ was observed after irradiation to a proton fluence of 1.1*10/sup 13/ cm/sup -2/. Despite the high degree of defect generation, the radiation resistance, of the heteroepitaxial cells was considerably greater than that observed for monolithic n/sup +/p InP cells. The observed low cell efficiencies and high radiation resistance are attributed to the dominant effect of dislocations in the cell's p-base region.<>
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Expertise, optimisation and control of InP and related technologies by scanning photoluminescence measurements Dislocation density after S-diffusion into p-type InP substrates Surface recombination and high efficiency in InP solar cells Molecular beam epitaxial growth techniques for graded-composition InGaAlAs/InP alloys Submicron double heterojunction strained InAlAs/InGaAs HEMTs: an experimental study of DC and microwave properties
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