A. Kasukawa, R. Bhat, C. Zah, M. Koza, S. Schwarz, T. Lee
{"title":"200 A/cm/sup 2/阈值电流密度1.5/spl mu/m / Gainas/aigainas应变层Grin-sch量子阱激光二极管","authors":"A. Kasukawa, R. Bhat, C. Zah, M. Koza, S. Schwarz, T. Lee","doi":"10.1109/DRC.1991.664666","DOIUrl":null,"url":null,"abstract":"Summary form only given. The authors report 1.5 mu m GaInAs/AlGaInAs GRIN-SCH SL (strained layer) QW (quantum well) LDs (laser diodes) having both compressive and tensile strain in the well. They were grown by low-pressure organometallic chemical vapor deposition (OMCVD). Very low threshold current densities of 200 and 400 A/cm/sup 2/ were obtained in tensile and compressive SL QW LDs, respectively. The characteristic temperatures were 60 K for a lattice-matched QW LD, 72 K for a compressive SL QW LD, and 50 K for a tensile SL QW LD. Lasing wavelengths were in the 1.5 mu m range for all cases. >","PeriodicalId":269691,"journal":{"name":"[1991] 49th Annual Device Research Conference Digest","volume":"47 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1991-06-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"200 A/cm/sup 2/ Threshold Current Density 1.5/spl mu/m Gainas/aigainas Strained-layer Grin-sch Quantum Well Laser Diodes Grown By Omcvd\",\"authors\":\"A. Kasukawa, R. Bhat, C. Zah, M. Koza, S. Schwarz, T. Lee\",\"doi\":\"10.1109/DRC.1991.664666\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Summary form only given. The authors report 1.5 mu m GaInAs/AlGaInAs GRIN-SCH SL (strained layer) QW (quantum well) LDs (laser diodes) having both compressive and tensile strain in the well. They were grown by low-pressure organometallic chemical vapor deposition (OMCVD). Very low threshold current densities of 200 and 400 A/cm/sup 2/ were obtained in tensile and compressive SL QW LDs, respectively. The characteristic temperatures were 60 K for a lattice-matched QW LD, 72 K for a compressive SL QW LD, and 50 K for a tensile SL QW LD. Lasing wavelengths were in the 1.5 mu m range for all cases. >\",\"PeriodicalId\":269691,\"journal\":{\"name\":\"[1991] 49th Annual Device Research Conference Digest\",\"volume\":\"47 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1991-06-17\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"[1991] 49th Annual Device Research Conference Digest\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/DRC.1991.664666\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"[1991] 49th Annual Device Research Conference Digest","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/DRC.1991.664666","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
200 A/cm/sup 2/ Threshold Current Density 1.5/spl mu/m Gainas/aigainas Strained-layer Grin-sch Quantum Well Laser Diodes Grown By Omcvd
Summary form only given. The authors report 1.5 mu m GaInAs/AlGaInAs GRIN-SCH SL (strained layer) QW (quantum well) LDs (laser diodes) having both compressive and tensile strain in the well. They were grown by low-pressure organometallic chemical vapor deposition (OMCVD). Very low threshold current densities of 200 and 400 A/cm/sup 2/ were obtained in tensile and compressive SL QW LDs, respectively. The characteristic temperatures were 60 K for a lattice-matched QW LD, 72 K for a compressive SL QW LD, and 50 K for a tensile SL QW LD. Lasing wavelengths were in the 1.5 mu m range for all cases. >