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[1991] 49th Annual Device Research Conference Digest最新文献

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Heterodyne Measurement of Linewidth, Tunability and Frequency Synthesis of Vertical-Cavity Surface-Emitting Laser Diode Arrays 垂直腔面发射激光二极管阵列线宽、可调性和频率合成的外差测量
Pub Date : 1991-06-17 DOI: 10.1109/DRC.1991.664684
G. Olbright, R. Bryan, W. S. Fu, R. Apte, D. Bloom
Summary form only given. The linewidth of vertical-cavity surface-emitting lasers (VCSELs) (65 MHz), the tunability of their lasing wavelength (20 AA), and the tunability of the heterodyne beat frequency (65 MHz to 150 GHz) were measured by varying the drive current to the lasers. The ability to control the output wavelength of VCSELs by current and location on the wafer makes it possible to extrapolate tunability over a range from 65 MHz to 3 THz. While the spatial tunability of 3 THz is of interest for wavelength-division multiplexing schemes, the current tunability of 150 GHz is attractive for frequency control and stabilization. The observation of narrow VCSEL linewidths is encouraging for their potential applications in communications. >
只提供摘要形式。通过改变驱动电流,测量了垂直腔面发射激光器(VCSELs)的线宽(65 MHz)、激光波长(20 AA)的可调性以及外差拍频(65 MHz ~ 150 GHz)的可调性。通过晶圆上的电流和位置控制vcsel输出波长的能力使得可以在65 MHz到3 THz的范围内推断可调性。虽然3thz的空间可调性对波分复用方案很有吸引力,但目前150ghz的可调性对频率控制和稳定很有吸引力。窄VCSEL线宽的观测对于其在通信中的潜在应用是令人鼓舞的。>
{"title":"Heterodyne Measurement of Linewidth, Tunability and Frequency Synthesis of Vertical-Cavity Surface-Emitting Laser Diode Arrays","authors":"G. Olbright, R. Bryan, W. S. Fu, R. Apte, D. Bloom","doi":"10.1109/DRC.1991.664684","DOIUrl":"https://doi.org/10.1109/DRC.1991.664684","url":null,"abstract":"Summary form only given. The linewidth of vertical-cavity surface-emitting lasers (VCSELs) (65 MHz), the tunability of their lasing wavelength (20 AA), and the tunability of the heterodyne beat frequency (65 MHz to 150 GHz) were measured by varying the drive current to the lasers. The ability to control the output wavelength of VCSELs by current and location on the wafer makes it possible to extrapolate tunability over a range from 65 MHz to 3 THz. While the spatial tunability of 3 THz is of interest for wavelength-division multiplexing schemes, the current tunability of 150 GHz is attractive for frequency control and stabilization. The observation of narrow VCSEL linewidths is encouraging for their potential applications in communications. >","PeriodicalId":269691,"journal":{"name":"[1991] 49th Annual Device Research Conference Digest","volume":"20 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1991-06-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"117160861","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
36 GHz Static Digital Frequency Dividers in AlInAs-Gainas Hbt Technology 基于AlInAs-Gainas Hbt技术的36ghz静态数字分频器
Pub Date : 1991-06-17 DOI: 10.1109/DRC.1991.664725
J. Jensen, W. Stanchina, R. A. Metzger, T. Liu, T. V. Kargodorian, M. W. Pierce, L. McCray
Summary form only given. Static divide-by-four circuits have been fabricated that operate up to 36 GHz using AlInAs-GaInAs heterojunction bipolar transistor (HBT) IC technology processing an f/sub t/ and f/sub max/ of 110 and 73 GHz, respectively. The transistors used consisted of an abrupt emitter-base junction design which incorporated a low-temperature p-GaInAs spacer as part of the base to inhibit beryllium diffusion. The AlInAs-GaInAs HBT device layers were grown lattice-matched to semi-insulating InP substrates by solid-source molecular beam epitaxy (MBE). >
只提供摘要形式。采用AlInAs-GaInAs异质结双极晶体管(HBT) IC技术,分别处理110 GHz和73 GHz的f/sub / t/和f/sub max/,制备了工作频率高达36 GHz的静态四分频电路。所使用的晶体管由一个突然的发射极-基底结设计组成,该设计将低温p-GaInAs间隔层作为基底的一部分,以抑制铍的扩散。采用固体源分子束外延技术(MBE)在半绝缘InP衬底上生长出晶格匹配的AlInAs-GaInAs HBT器件层。>
{"title":"36 GHz Static Digital Frequency Dividers in AlInAs-Gainas Hbt Technology","authors":"J. Jensen, W. Stanchina, R. A. Metzger, T. Liu, T. V. Kargodorian, M. W. Pierce, L. McCray","doi":"10.1109/DRC.1991.664725","DOIUrl":"https://doi.org/10.1109/DRC.1991.664725","url":null,"abstract":"Summary form only given. Static divide-by-four circuits have been fabricated that operate up to 36 GHz using AlInAs-GaInAs heterojunction bipolar transistor (HBT) IC technology processing an f/sub t/ and f/sub max/ of 110 and 73 GHz, respectively. The transistors used consisted of an abrupt emitter-base junction design which incorporated a low-temperature p-GaInAs spacer as part of the base to inhibit beryllium diffusion. The AlInAs-GaInAs HBT device layers were grown lattice-matched to semi-insulating InP substrates by solid-source molecular beam epitaxy (MBE). >","PeriodicalId":269691,"journal":{"name":"[1991] 49th Annual Device Research Conference Digest","volume":"74 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1991-06-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128804467","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 11
High Gain Resonant Ingaaias/ingaas Heterojunction Bipolar Phototransistor Grown by Molecular Beam Epitaxy 分子束外延生长的高增益谐振Ingaaias/ingaas异质结双极光电晶体管
Pub Date : 1991-06-17 DOI: 10.1109/DRC.1991.664697
A. Dodabalapur, T. Chang
{"title":"High Gain Resonant Ingaaias/ingaas Heterojunction Bipolar Phototransistor Grown by Molecular Beam Epitaxy","authors":"A. Dodabalapur, T. Chang","doi":"10.1109/DRC.1991.664697","DOIUrl":"https://doi.org/10.1109/DRC.1991.664697","url":null,"abstract":"","PeriodicalId":269691,"journal":{"name":"[1991] 49th Annual Device Research Conference Digest","volume":"87 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1991-06-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132996864","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
On the Investigation of Degradation Mechanisms in Ultra-High Performance Gaas Heterojunction Bipolar Transistors 超高性能Gaas异质结双极晶体管退化机理研究
Pub Date : 1991-06-17 DOI: 10.1109/DRC.1991.664724
Yang-Hua Chang, G. Li, A. Oki, D. Streit, M. Hafizi, M.E. Kim
Summary form only given. Recently, current-induced degradation in the form of V/sub BE/ shifts has been reported when the heterojunction is stressed under high-level forward current injection. Although the V/sub BE/ shift is an indication of device parameter change, the degradation mechanisms cannot be readily identified. An approach is presented that uncovers the device degradation mechanisms by measuring the inverted mode I/sub C/ at room temperature and the forward mode I/sub B/ at low temperature. The correlation between the change in the inverted I/sub C/ and an anomalous component (tunneling current) of I/sub B/ is observed and attributed to beryllium interstitial diffusion into substitutional sites. >
只提供摘要形式。最近,当异质结在高水平正向电流注入下受到应力时,电流诱导的V/sub / BE/移位形式的退化已经被报道。虽然V/sub / BE/ shift是器件参数变化的指示,但退化机制不能轻易确定。提出了一种通过测量室温下的I/sub C/反转模式和低温下的I/sub B/正向模式来揭示器件退化机制的方法。倒置I/sub - C/的变化与I/sub - B/的异常分量(隧道电流)之间的相关性被观察到,并归因于铍向取代位的间隙扩散。>
{"title":"On the Investigation of Degradation Mechanisms in Ultra-High Performance Gaas Heterojunction Bipolar Transistors","authors":"Yang-Hua Chang, G. Li, A. Oki, D. Streit, M. Hafizi, M.E. Kim","doi":"10.1109/DRC.1991.664724","DOIUrl":"https://doi.org/10.1109/DRC.1991.664724","url":null,"abstract":"Summary form only given. Recently, current-induced degradation in the form of V/sub BE/ shifts has been reported when the heterojunction is stressed under high-level forward current injection. Although the V/sub BE/ shift is an indication of device parameter change, the degradation mechanisms cannot be readily identified. An approach is presented that uncovers the device degradation mechanisms by measuring the inverted mode I/sub C/ at room temperature and the forward mode I/sub B/ at low temperature. The correlation between the change in the inverted I/sub C/ and an anomalous component (tunneling current) of I/sub B/ is observed and attributed to beryllium interstitial diffusion into substitutional sites. >","PeriodicalId":269691,"journal":{"name":"[1991] 49th Annual Device Research Conference Digest","volume":"17 7","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1991-06-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132748102","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Reduction of Low-Frequency Noise in Npn Aigaas/gaas HBTs Npn Aigaas/gaas HBTs中低频噪声的降低
Pub Date : 1991-06-17 DOI: 10.1109/DRC.1991.664723
D. Costa, W.U. Liu, J. Harris
{"title":"Reduction of Low-Frequency Noise in Npn Aigaas/gaas HBTs","authors":"D. Costa, W.U. Liu, J. Harris","doi":"10.1109/DRC.1991.664723","DOIUrl":"https://doi.org/10.1109/DRC.1991.664723","url":null,"abstract":"","PeriodicalId":269691,"journal":{"name":"[1991] 49th Annual Device Research Conference Digest","volume":"88 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1991-06-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122495828","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Development of an Interactive Design Environment for Heterostructure and Quantum-Well Devices 异质结构和量子阱器件交互设计环境的开发
Pub Date : 1991-06-17 DOI: 10.1109/DRC.1991.664696
W. Frensley
Summary form only given. Heterostructures provide so many design parameters that it is impractical to adequately explore the design space empirically. The ability to evaluate the effects of changes to any design parameter rapidly is needed. A program, BandProf, that implements a one-dimensional, zero-current model to determine the self-consistent electrostatic potential and thus the energy-band profile is discussed. Realistic physical models are employed, including multiple-band extrema and full impurity statistics. This approach to device simulation, demanding results in a few seconds for structures of arbitrary design, requires that elegant and robust techniques be applied to every task performed by the program. Two such innovations embodied in BandProf are described. >
只提供摘要形式。异质结构提供了如此多的设计参数,以至于从经验上充分探索设计空间是不切实际的。需要快速评估任何设计参数变化的影响的能力。一个程序,BandProf,实现了一个一维,零电流模型,以确定自一致的静电势,从而确定能带轮廓。采用了真实的物理模型,包括多波段极值和全杂质统计。这种设备模拟方法要求在几秒钟内得到任意设计结构的结果,要求将优雅而强大的技术应用于程序执行的每一项任务。描述了BandProf中体现的两个这样的创新。>
{"title":"Development of an Interactive Design Environment for Heterostructure and Quantum-Well Devices","authors":"W. Frensley","doi":"10.1109/DRC.1991.664696","DOIUrl":"https://doi.org/10.1109/DRC.1991.664696","url":null,"abstract":"Summary form only given. Heterostructures provide so many design parameters that it is impractical to adequately explore the design space empirically. The ability to evaluate the effects of changes to any design parameter rapidly is needed. A program, BandProf, that implements a one-dimensional, zero-current model to determine the self-consistent electrostatic potential and thus the energy-band profile is discussed. Realistic physical models are employed, including multiple-band extrema and full impurity statistics. This approach to device simulation, demanding results in a few seconds for structures of arbitrary design, requires that elegant and robust techniques be applied to every task performed by the program. Two such innovations embodied in BandProf are described. >","PeriodicalId":269691,"journal":{"name":"[1991] 49th Annual Device Research Conference Digest","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1991-06-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114792746","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 8
A New Method to Enhance Mobility of Poly-Si Tft Recrystallized by Excimer Laser Annealing 准分子激光退火提高多晶硅Tft再结晶迁移率的新方法
Pub Date : 1991-06-17 DOI: 10.1109/DRC.1991.664674
H. Kuriyama, S. Kiyama, T. Kuwahara, S. Noguchi, S. Nakano
Summary form only given. A SEM study after dry etching was conducted for poly-Si films recrystallized by excimer laser annealing. It was found that the grain size could be enlarged to about 300 nm using the low-temperature (400 degrees C) substrate heating method. The authors propose a low-temperature ( >
只提供摘要形式。对准分子激光退火再结晶的多晶硅薄膜进行了干法刻蚀后的扫描电镜研究。结果表明,采用低温(400℃)衬底加热方法,晶粒尺寸可扩大到300 nm左右。作者提出了一种低温(>)
{"title":"A New Method to Enhance Mobility of Poly-Si Tft Recrystallized by Excimer Laser Annealing","authors":"H. Kuriyama, S. Kiyama, T. Kuwahara, S. Noguchi, S. Nakano","doi":"10.1109/DRC.1991.664674","DOIUrl":"https://doi.org/10.1109/DRC.1991.664674","url":null,"abstract":"Summary form only given. A SEM study after dry etching was conducted for poly-Si films recrystallized by excimer laser annealing. It was found that the grain size could be enlarged to about 300 nm using the low-temperature (400 degrees C) substrate heating method. The authors propose a low-temperature ( >","PeriodicalId":269691,"journal":{"name":"[1991] 49th Annual Device Research Conference Digest","volume":"22 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1991-06-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133749046","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Ultra-Compact Monolithic Integration of Polarization Diversity Waveguide/Photodiodes 偏振分集波导/光电二极管的超紧凑单片集成
Pub Date : 1991-06-17 DOI: 10.1109/DRC.1991.664715
R. J. Den, E. Pennings, R. Hawkins, C. Caneau
Summary form only given. A description is given of a device which consists of an input rib waveguide, a vertically defined coupler, a vertically coupled mesa p-i-n photodiode (PD), a second coupler, and a second PD, all serially connected. A gold cover on the first coupler ensures that only TE-polarized light is coupled into the first PD; the second coupler/PD pair collects the remaining TM light. Component lengths are 79 and 54 mu m for couplers and 21 and 31 mu m for PDs, for approximately 200- mu m total detector length. The device consists of p-InGaAsP/i-InGaAs/n-InGaAsP PD layers above semi-insulating coupler layers (two GaAsP:Fe guides, InP:Fe cladding). The vertically integrated coupler/detectors are more than an order of magnitude smaller than conventional couplers, and of comparable size to electronic components (e.g. FET gate widths). >
只提供摘要形式。描述了一种由输入肋波导、垂直定义耦合器、垂直耦合台面p-i-n光电二极管(PD)、第二耦合器和第二PD组成的器件,所有器件均串行连接。第一耦合器上的金盖确保只有te偏振光耦合到第一PD;第二耦合器/PD对收集剩余的TM光。耦合器的元件长度为79 μ m和54 μ m, pd的元件长度为21 μ m和31 μ m,检测器总长度约为200 μ m。该器件由半绝缘耦合器层(两个GaAsP:Fe波导,InP:Fe包层)之上的p-InGaAsP/i-InGaAs/n-InGaAsP PD层组成。垂直集成的耦合器/检测器比传统的耦合器小一个数量级以上,并且与电子元件的尺寸相当(例如FET栅极宽度)。>
{"title":"Ultra-Compact Monolithic Integration of Polarization Diversity Waveguide/Photodiodes","authors":"R. J. Den, E. Pennings, R. Hawkins, C. Caneau","doi":"10.1109/DRC.1991.664715","DOIUrl":"https://doi.org/10.1109/DRC.1991.664715","url":null,"abstract":"Summary form only given. A description is given of a device which consists of an input rib waveguide, a vertically defined coupler, a vertically coupled mesa p-i-n photodiode (PD), a second coupler, and a second PD, all serially connected. A gold cover on the first coupler ensures that only TE-polarized light is coupled into the first PD; the second coupler/PD pair collects the remaining TM light. Component lengths are 79 and 54 mu m for couplers and 21 and 31 mu m for PDs, for approximately 200- mu m total detector length. The device consists of p-InGaAsP/i-InGaAs/n-InGaAsP PD layers above semi-insulating coupler layers (two GaAsP:Fe guides, InP:Fe cladding). The vertically integrated coupler/detectors are more than an order of magnitude smaller than conventional couplers, and of comparable size to electronic components (e.g. FET gate widths). >","PeriodicalId":269691,"journal":{"name":"[1991] 49th Annual Device Research Conference Digest","volume":"49 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1991-06-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125598191","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 4
Optical Confinement Factor Dependence of K-factor, Differential Gain and Nonlinear Gain in 1.55/spl mu/m Mqw and Strained Mqw Lasers 1.55/spl μ m Mqw和应变Mqw激光器中k因子、差分增益和非线性增益的光约束因子依赖性
Pub Date : 1991-06-17 DOI: 10.1109/DRC.1991.664683
J. Shimizu, H. Yamada, S. Murata, A. Tomita, M. Kitamura, A. Suzuki
Summary form only given. Systematic studies on the optical confinement factor dependence of the K-factor, differential gain, and nonlinear gain coefficient in 1.55- mu m MQW and strained MQW lasers are reported. The most important conclusion of these studies is that the K-factors in the MQW and strained MQW lasers are reduced as the optical confinement factor is increased. This mainly results from the increase in the differential gain. Strained MQW lasers with large optical confinement factors are expected to achieve small K-factors and large modulation bandwidths. >
只提供摘要形式。系统地研究了1.55 μ m MQW和应变MQW激光器中k因子、差分增益和非线性增益系数与光约束因子的依赖关系。这些研究最重要的结论是,随着光约束因子的增加,MQW和应变MQW激光器中的k因子减小。这主要是由于差分增益的增加。具有大光约束因子的应变MQW激光器有望实现小k因子和大调制带宽。>
{"title":"Optical Confinement Factor Dependence of K-factor, Differential Gain and Nonlinear Gain in 1.55/spl mu/m Mqw and Strained Mqw Lasers","authors":"J. Shimizu, H. Yamada, S. Murata, A. Tomita, M. Kitamura, A. Suzuki","doi":"10.1109/DRC.1991.664683","DOIUrl":"https://doi.org/10.1109/DRC.1991.664683","url":null,"abstract":"Summary form only given. Systematic studies on the optical confinement factor dependence of the K-factor, differential gain, and nonlinear gain coefficient in 1.55- mu m MQW and strained MQW lasers are reported. The most important conclusion of these studies is that the K-factors in the MQW and strained MQW lasers are reduced as the optical confinement factor is increased. This mainly results from the increase in the differential gain. Strained MQW lasers with large optical confinement factors are expected to achieve small K-factors and large modulation bandwidths. >","PeriodicalId":269691,"journal":{"name":"[1991] 49th Annual Device Research Conference Digest","volume":"29 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1991-06-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116700627","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
High Speed Single Quantum Well Ingaas/gaas Laser Design and Experiment 高速单量子阱Ingaas/gaas激光器设计与实验
Pub Date : 1991-06-17 DOI: 10.1109/DRC.1991.664665
R. Nagarajan, T. Fukushima, J. Bowers, R. Geels, L. Coldren
Summary form only given. The authors report damping factors an order of magnitude lower than previously reported for SQW lasers. They also report bandwidths of 15 GHz obtained in SQW (single quantum well) lasers as a result of proper design of the quantum-well structure. The laser samples were grown on
只提供摘要形式。作者报告的阻尼因子比先前报道的SQW激光器低一个数量级。他们还报告说,由于量子阱结构的适当设计,SQW(单量子阱)激光器获得了15 GHz的带宽。在激光样品上生长
{"title":"High Speed Single Quantum Well Ingaas/gaas Laser Design and Experiment","authors":"R. Nagarajan, T. Fukushima, J. Bowers, R. Geels, L. Coldren","doi":"10.1109/DRC.1991.664665","DOIUrl":"https://doi.org/10.1109/DRC.1991.664665","url":null,"abstract":"Summary form only given. The authors report damping factors an order of magnitude lower than previously reported for SQW lasers. They also report bandwidths of 15 GHz obtained in SQW (single quantum well) lasers as a result of proper design of the quantum-well structure. The laser samples were grown on","PeriodicalId":269691,"journal":{"name":"[1991] 49th Annual Device Research Conference Digest","volume":"13 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1991-06-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114423775","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
期刊
[1991] 49th Annual Device Research Conference Digest
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