Prediction Method of 3-D Shape Fabricated by Double Exposure Technique in Deep X-Ray Lithography (D2XRL)

This article describes an analytical method of predicting a processed structural shape by a double exposure technique in deep X-ray lithography (D2XRL). Firstly, the concept of calculating the processed shape efficiently by simple equations was considered. Secondly, important functions composing the simple equations, i.e., absorbed dose as a function of depth and dissolution rate as a function of absorbed dose, were experimentally determined with high accuracy by a newly proposed method. Lastly, the processed shape was predicted by the analytical method. By comparing the predicted result with the experimental one under the same condition, we confirmed that the processed shape was predicted with acceptable accuracy.