LP-MOVPE控制GaInAs/InP MQW和GaInAsP/GaInAs分离约束MQW激光结构的生长

D. Grutzmacher, J. Hergeth, M. Glade, K. Wolter, F. Reinhardt, F. Fidorra, P. Wolfram, P. Balk
{"title":"LP-MOVPE控制GaInAs/InP MQW和GaInAsP/GaInAs分离约束MQW激光结构的生长","authors":"D. Grutzmacher, J. Hergeth, M. Glade, K. Wolter, F. Reinhardt, F. Fidorra, P. Wolfram, P. Balk","doi":"10.1109/ICIPRM.1990.203030","DOIUrl":null,"url":null,"abstract":"Using a low-pressure MOVPE growth process for GaInAs/InP and GaInAs/GaInAsP multiple-quantum-well (MQW) lasers, stringent requirements for interface abruptness and the diffusion of the p-type dopant, among others, were met. In the optimized growth process the well width is controlled in fractions of one monolayer and the diffusion coefficient of Zn is reduced to 6.5*10/sup -14/ cm/sup 2//s. Failure to improve the laser characteristics by replacing the GaInAsP active layer by a GaInAs/InP MQW is caused by inefficient heavy hole injection across the InP barriers. For lasers containing four GaInAs wells, threshold current density as low as 0.61 kA/cm/sup 2/ (L=800 mu m) was observed.<<ETX>>","PeriodicalId":138960,"journal":{"name":"International Conference on Indium Phosphide and Related Materials","volume":"36 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1990-04-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Controlled growth of GaInAs/InP MQW and GaInAsP/GaInAs separate confinement MQW laser structures by LP-MOVPE\",\"authors\":\"D. Grutzmacher, J. Hergeth, M. Glade, K. Wolter, F. Reinhardt, F. Fidorra, P. Wolfram, P. Balk\",\"doi\":\"10.1109/ICIPRM.1990.203030\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Using a low-pressure MOVPE growth process for GaInAs/InP and GaInAs/GaInAsP multiple-quantum-well (MQW) lasers, stringent requirements for interface abruptness and the diffusion of the p-type dopant, among others, were met. In the optimized growth process the well width is controlled in fractions of one monolayer and the diffusion coefficient of Zn is reduced to 6.5*10/sup -14/ cm/sup 2//s. Failure to improve the laser characteristics by replacing the GaInAsP active layer by a GaInAs/InP MQW is caused by inefficient heavy hole injection across the InP barriers. For lasers containing four GaInAs wells, threshold current density as low as 0.61 kA/cm/sup 2/ (L=800 mu m) was observed.<<ETX>>\",\"PeriodicalId\":138960,\"journal\":{\"name\":\"International Conference on Indium Phosphide and Related Materials\",\"volume\":\"36 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1990-04-23\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"International Conference on Indium Phosphide and Related Materials\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICIPRM.1990.203030\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Conference on Indium Phosphide and Related Materials","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICIPRM.1990.203030","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

摘要

采用低压MOVPE生长工艺制备GaInAs/InP和GaInAs/GaInAsP多量子阱(MQW)激光器,满足了对界面陡度和p型掺杂物扩散等方面的严格要求。在优化后的生长过程中,井宽被控制在单个单层的分数段内,锌的扩散系数降低到6.5 × 10/sup ~ 14/ cm/sup 2/ s。用GaInAs/InP MQW取代GaInAsP有源层无法改善激光特性,主要原因是InP势垒上的重空穴注入效率低下。对于含有四个GaInAs阱的激光器,观察到阈值电流密度低至0.61 kA/cm/sup 2/ (L=800 μ m)。
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Controlled growth of GaInAs/InP MQW and GaInAsP/GaInAs separate confinement MQW laser structures by LP-MOVPE
Using a low-pressure MOVPE growth process for GaInAs/InP and GaInAs/GaInAsP multiple-quantum-well (MQW) lasers, stringent requirements for interface abruptness and the diffusion of the p-type dopant, among others, were met. In the optimized growth process the well width is controlled in fractions of one monolayer and the diffusion coefficient of Zn is reduced to 6.5*10/sup -14/ cm/sup 2//s. Failure to improve the laser characteristics by replacing the GaInAsP active layer by a GaInAs/InP MQW is caused by inefficient heavy hole injection across the InP barriers. For lasers containing four GaInAs wells, threshold current density as low as 0.61 kA/cm/sup 2/ (L=800 mu m) was observed.<>
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