多晶片集成的大型扇出封装翘曲和RDL应力分析

Jen-Hsien Wong, Nan-Yi Wu, W. Lai, Dao-Long Chen, Tang-Yuan Chen, Chung-Hao Chen, Yi-Hsien Wu, Yung-shun Chang, C. Kao, D. Tarng, Teck Chong Lee, C. Hung
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引用次数: 2

摘要

高性能计算(HPC)、数据中心服务器、路由器、交换器等应用需要先进的封装技术来实现大数据的数字化产业。由于上述市场需求的饥渴,引起了科研院所和产业界的极大兴趣。多芯片集成可提供设计灵活性、高性能和功耗效率。因此,这种应用需要先进的封装技术。最后芯片(Chip-last foco)是最好的选择之一,它是一种先进的封装技术,可以在单个封装中实现不同功能的小芯片。这项技术可以提高产量、性能和成本,缩短产品上市时间。在多芯片集成的大型扇出封装中,封装翘曲控制是一个非常具有挑战性的问题。热循环测试(TCT)中,重分布层(RDL)轨迹断裂风险也是影响封装可靠性的关键问题。高cte错配效应在模对模(D2D)间隙显著。由于多种材料具有复杂的多层结构,RDL应力对材料性能、工艺流程和几何结构更为敏感。在每个过程限制下最小化RDL跟踪压力是一项更困难的工作。本文对室温(RT)和高温(HT)下的RDL轨迹应力与轨迹布局、线/间距(L/S)、D2D间隙距离和轨迹位置进行了详细比较。结果表明,走线布局设计和走线位置对提高可靠性性能起着至关重要的作用。
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Warpage and RDL Stress Analysis in Large Fan-Out Package with Multi-Chiplet Integration
As the advanced packaging technology is required to fulfill digitalized industry with big data, such as high performance computing (HPC), data center server, router, and switcher applications. Due to the hunger from above market needs, great interests were induced by both research institutes and industry. Multiple chiplets integration can provide design flexibility, high performance and power efficiency. Therefore, advanced package technology is needed for this application. Chip-last FOCoS, one of the best options, is developed as advanced packaging technology to enable different functional chiplets within a single package. This technology can improve yield, performance and cost to shorten the time to market. The package warpage control is very challenging in assembly of larger fan-out package with multi-chip integration. The redistribution layer (RDL) trace broken risk is also key issue to influence package reliability in thermal cycling test (TCT). High CTE-mismatch effect was significantly occurred at die to die (D2D) gap. The RDL trace stress is more sensitive to material properties, process flow and geometric structure due to complex multi-layer structure in several materials. It is a tougher job to minimize RDL trace stress under each process limitation. In this paper, the RDL trace stress is compared in detail to trace layout, line/spaces (L/S), D2D gap distance and trace location at room temperature (RT) and high temperature (HT). The results indicate that the trace layout design and trace location play critical roles to enhance reliability performance.
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