基于65nm CMOS的1.0GHz多组嵌入式DRAM,具有并行刷新和分层BIST特性

D. Anand, J. Covino, J. Dreibelbis, J. Fifield, Kevin W. Gorman, M. Jacunski, Jake Paparelli, G. Pomichter, D. Pontius, M. Roberge, Stephen Sliva
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引用次数: 4

摘要

在65纳米CMOS中制造的嵌入式DRAM宏在1.0 V下实现了1.0 GHz多银行操作,产生584 gbit /s。该阵列采用0.1 mm2电池,20 fF深沟电容器和2.2 nm栅氧化转移栅。并发刷新允许通过第二个银行地址实现高可用性。高速测试和修复是通过一种新的分层式BIST架构完成的。测量的随机周期时间在1.0 V下超过333 MHz,功能工作范围为750 mV至1.5 V,密度高达36.5 Mbits。
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A 1.0GHz multi-banked embedded DRAM in 65nm CMOS featuring concurrent refresh and hierarchical BIST
An embedded DRAM macro fabricated in 65 nm CMOS achieves 1.0 GHz multi-banked operation at 1.0 V yielding 584 Gbits/sec. The array utilizes a 0.1 1 mum2 cell with 20 fF deep trench capacitor and 2.2 nm gate oxide transfer gate. Concurrent refresh allows for high availability via a second bank address. At-speed test and repair is accomplished with a new hierarchical BIST architecture. Measured random cycle time exceeds 333 MHz at 1.0 V with functional operation from 750 mV to 1.5 V and densities up to 36.5 Mbits.
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