{"title":"一个全面的CAM环境，用于快速的IC原型设计","authors":"C.B. Barnum, D. Cunningham","doi":"10.1109/ASMC.1990.111230","DOIUrl":null,"url":null,"abstract":"A prototype integrated-circuit (IC) computer-aided-manufacturing (CAM) environment to support university education and research programs is described. The CAM system, mask making, and wafer fabrication are discussed. Process controls and the assembly process are described.<<ETX>>","PeriodicalId":158760,"journal":{"name":"IEEE/SEMI Conference on Advanced Semiconductor Manufacturing Workshop","volume":"87 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1990-09-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"A comprehensive CAM environment for fast-turn IC prototyping\",\"authors\":\"C.B. Barnum, D. Cunningham\",\"doi\":\"10.1109/ASMC.1990.111230\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A prototype integrated-circuit (IC) computer-aided-manufacturing (CAM) environment to support university education and research programs is described. The CAM system, mask making, and wafer fabrication are discussed. Process controls and the assembly process are described.<<ETX>>\",\"PeriodicalId\":158760,\"journal\":{\"name\":\"IEEE/SEMI Conference on Advanced Semiconductor Manufacturing Workshop\",\"volume\":\"87 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1990-09-11\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"IEEE/SEMI Conference on Advanced Semiconductor Manufacturing Workshop\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ASMC.1990.111230\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE/SEMI Conference on Advanced Semiconductor Manufacturing Workshop","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ASMC.1990.111230","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
A comprehensive CAM environment for fast-turn IC prototyping
A prototype integrated-circuit (IC) computer-aided-manufacturing (CAM) environment to support university education and research programs is described. The CAM system, mask making, and wafer fabrication are discussed. Process controls and the assembly process are described.<>
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