{"title":"集成电路过程特性模型建立与统计分析方法研究进展","authors":"H. Yie, Yao Jiannan","doi":"10.1109/ICMTS.1990.161739","DOIUrl":null,"url":null,"abstract":"Combined with a microelectronic test structure, an experimental design model building methodology is developed, where a self-consistent subdomain decomposition method is used to assure high accuracy and reasonable computation costs simultaneously. With some examples, the application of the derived regression model in IC performance prediction and optimum process design is discussed. A real-time statistical process analysis methodology that is incorporated with the experimental design method is presented. The applicability of the real-time statistical analysis methodology is demonstrated.<<ETX>>","PeriodicalId":417292,"journal":{"name":"Proceedings of the 1991 International Conference on Microelectronic Test Structures","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1990-03-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Progress on model building and statistical analysis methodology of IC characteristics with process\",\"authors\":\"H. Yie, Yao Jiannan\",\"doi\":\"10.1109/ICMTS.1990.161739\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Combined with a microelectronic test structure, an experimental design model building methodology is developed, where a self-consistent subdomain decomposition method is used to assure high accuracy and reasonable computation costs simultaneously. With some examples, the application of the derived regression model in IC performance prediction and optimum process design is discussed. A real-time statistical process analysis methodology that is incorporated with the experimental design method is presented. The applicability of the real-time statistical analysis methodology is demonstrated.<<ETX>>\",\"PeriodicalId\":417292,\"journal\":{\"name\":\"Proceedings of the 1991 International Conference on Microelectronic Test Structures\",\"volume\":\"1 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1990-03-18\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings of the 1991 International Conference on Microelectronic Test Structures\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICMTS.1990.161739\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of the 1991 International Conference on Microelectronic Test Structures","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICMTS.1990.161739","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Progress on model building and statistical analysis methodology of IC characteristics with process
Combined with a microelectronic test structure, an experimental design model building methodology is developed, where a self-consistent subdomain decomposition method is used to assure high accuracy and reasonable computation costs simultaneously. With some examples, the application of the derived regression model in IC performance prediction and optimum process design is discussed. A real-time statistical process analysis methodology that is incorporated with the experimental design method is presented. The applicability of the real-time statistical analysis methodology is demonstrated.<>