设计级联编码NMOS输出缓冲器,最大V/sub t1/

J. Miller, M. Khazhinsky, J. Weldon
{"title":"设计级联编码NMOS输出缓冲器,最大V/sub t1/","authors":"J. Miller, M. Khazhinsky, J. Weldon","doi":"10.1109/EOSESD.2000.890090","DOIUrl":null,"url":null,"abstract":"The overall ESD performance of CMOS integrated circuits is often limited by the ESD robustness of the lateral NPN (LNPN) bipolar transistor parasitic to the NMOS output buffer. In this paper, we investigate layout and bias options for maximizing the lateral NPN bipolar trigger voltage V/sub t1/ of the cascoded NMOSFET output buffer. Based on experimental data and device simulations, we demonstrate: (1) how bipolar turn-on characteristics change with buffer layout; and (2) how V/sub t1/ may be significantly increased by applying bias to the upper NMOSFET gate. Example circuits which produce these preferential ESD bias conditions are shown.","PeriodicalId":332394,"journal":{"name":"Electrical Overstress/Electrostatic Discharge Symposium Proceedings 2000 (IEEE Cat. No.00TH8476)","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2000-09-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"48","resultStr":"{\"title\":\"Engineering the cascoded NMOS output buffer for maximum V/sub t1/\",\"authors\":\"J. Miller, M. Khazhinsky, J. Weldon\",\"doi\":\"10.1109/EOSESD.2000.890090\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The overall ESD performance of CMOS integrated circuits is often limited by the ESD robustness of the lateral NPN (LNPN) bipolar transistor parasitic to the NMOS output buffer. In this paper, we investigate layout and bias options for maximizing the lateral NPN bipolar trigger voltage V/sub t1/ of the cascoded NMOSFET output buffer. Based on experimental data and device simulations, we demonstrate: (1) how bipolar turn-on characteristics change with buffer layout; and (2) how V/sub t1/ may be significantly increased by applying bias to the upper NMOSFET gate. Example circuits which produce these preferential ESD bias conditions are shown.\",\"PeriodicalId\":332394,\"journal\":{\"name\":\"Electrical Overstress/Electrostatic Discharge Symposium Proceedings 2000 (IEEE Cat. No.00TH8476)\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2000-09-26\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"48\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Electrical Overstress/Electrostatic Discharge Symposium Proceedings 2000 (IEEE Cat. No.00TH8476)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/EOSESD.2000.890090\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Electrical Overstress/Electrostatic Discharge Symposium Proceedings 2000 (IEEE Cat. No.00TH8476)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/EOSESD.2000.890090","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 48

摘要

CMOS集成电路的整体ESD性能通常受到寄生于NMOS输出缓冲器的横向NPN (LNPN)双极晶体管ESD稳健性的限制。在本文中,我们研究了最大化级联编码NMOSFET输出缓冲器的横向NPN双极触发电压V/sub t1/的布局和偏置选项。基于实验数据和器件仿真,我们证明了:(1)双极导通特性随缓冲布局的变化;以及(2)如何通过对NMOSFET上栅极施加偏置来显着增加V/sub t1/。给出了产生这些优先ESD偏置条件的示例电路。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
Engineering the cascoded NMOS output buffer for maximum V/sub t1/
The overall ESD performance of CMOS integrated circuits is often limited by the ESD robustness of the lateral NPN (LNPN) bipolar transistor parasitic to the NMOS output buffer. In this paper, we investigate layout and bias options for maximizing the lateral NPN bipolar trigger voltage V/sub t1/ of the cascoded NMOSFET output buffer. Based on experimental data and device simulations, we demonstrate: (1) how bipolar turn-on characteristics change with buffer layout; and (2) how V/sub t1/ may be significantly increased by applying bias to the upper NMOSFET gate. Example circuits which produce these preferential ESD bias conditions are shown.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
ESD damage thresholds: history and prognosis [magnetic heads] Electrostatic discharge characterization of epitaxial-base silicon-germanium heterojunction bipolar transistors A study of static-dissipative tweezers for handling giant magneto-resistive recording heads A study of the mechanisms for ESD damage to reticles Floating gate EEPROM as EOS indicators during wafer-level GMR processing
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1