缓冲层材料对InGaAs场效应管优化的影响

D. Newson, R. Merrett, M. Lee, E. Scott
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引用次数: 4

摘要

研究了δ掺杂异质结构绝缘栅场效应管(higfet)的噪声性能是否足以满足光接收机的应用。研究了AlInAs和InP的栅极绝缘子和缓冲层的适用性。前者具有更宽的带隙,因此将提供更好的约束和更低的栅极泄漏电流,而InP具有减少捕获从而降低噪声的前景。介绍了实验结构和实验步骤,并对实验结果进行了讨论。研究发现,如果选择适当的偏置条件以最小化InP载流子约束的影响,则较低的陷阱密度的InP缓冲层确实可以获得较好的噪声性能。
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Influence of buffer layer material on InGaAs FET optimisation
A study was performed to investigate whether the noise performance of delta-doped heterostructure-insulated-gate FETs (HIGFETs) is adequate for optical receiver applications. The suitability of gate insulator and buffer layers of both AlInAs and InP was investigated. The former has the wider bandgap and will thus give better confinement and lower gate leakage currents, whereas InP has the prospect of reduced trapping and thus of lower noise. The test structures and experimental procedures are described, and the results are discussed. It is found that the lower trap density of InP buffer layers does result in better noise performance if the bias conditions are chosen to minimize the effect of the poorer carrier confinement of InP.<>
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