用于低压低功耗应用的绝缘体上硅(SOI) MOSFET通道设计

Bing Yang, Ru Huang, Xing Zhang, Yangyuan Wang
{"title":"用于低压低功耗应用的绝缘体上硅(SOI) MOSFET通道设计","authors":"Bing Yang, Ru Huang, Xing Zhang, Yangyuan Wang","doi":"10.1109/ICSICT.1998.786092","DOIUrl":null,"url":null,"abstract":"For silicon-on-insulator (SOI) technology compared with the bulk circuit, an obvious improvement in power consumption and speed is always observed for the corresponding SOI circuit. Due to their electrical properties, SOI devices may be a solution for low-power application. But FD devices and PD devices have different properties. Detailed analysis and comparison between the different SOI devices operating at low voltage is needed. In this paper, Medici 4.0 is used to study FD and FD devices. Different device parameter influence on devices and circuits behaviour is described.","PeriodicalId":286980,"journal":{"name":"1998 5th International Conference on Solid-State and Integrated Circuit Technology. Proceedings (Cat. No.98EX105)","volume":"30 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1998-10-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Channel design of silicon-on-insulator (SOI) MOSFET for low-voltage low-power application\",\"authors\":\"Bing Yang, Ru Huang, Xing Zhang, Yangyuan Wang\",\"doi\":\"10.1109/ICSICT.1998.786092\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"For silicon-on-insulator (SOI) technology compared with the bulk circuit, an obvious improvement in power consumption and speed is always observed for the corresponding SOI circuit. Due to their electrical properties, SOI devices may be a solution for low-power application. But FD devices and PD devices have different properties. Detailed analysis and comparison between the different SOI devices operating at low voltage is needed. In this paper, Medici 4.0 is used to study FD and FD devices. Different device parameter influence on devices and circuits behaviour is described.\",\"PeriodicalId\":286980,\"journal\":{\"name\":\"1998 5th International Conference on Solid-State and Integrated Circuit Technology. Proceedings (Cat. No.98EX105)\",\"volume\":\"30 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1998-10-21\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"1998 5th International Conference on Solid-State and Integrated Circuit Technology. Proceedings (Cat. No.98EX105)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICSICT.1998.786092\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"1998 5th International Conference on Solid-State and Integrated Circuit Technology. Proceedings (Cat. No.98EX105)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICSICT.1998.786092","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

对于绝缘体上硅(SOI)技术,与本体电路相比,相应的SOI电路在功耗和速度上总是有明显的提高。由于其电气特性,SOI器件可能是低功耗应用的解决方案。但是FD器件和PD器件具有不同的特性。需要对不同的SOI器件在低电压下工作进行详细的分析和比较。本文使用Medici 4.0对FD和FD设备进行研究。描述了不同器件参数对器件和电路性能的影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
Channel design of silicon-on-insulator (SOI) MOSFET for low-voltage low-power application
For silicon-on-insulator (SOI) technology compared with the bulk circuit, an obvious improvement in power consumption and speed is always observed for the corresponding SOI circuit. Due to their electrical properties, SOI devices may be a solution for low-power application. But FD devices and PD devices have different properties. Detailed analysis and comparison between the different SOI devices operating at low voltage is needed. In this paper, Medici 4.0 is used to study FD and FD devices. Different device parameter influence on devices and circuits behaviour is described.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Silicon nano-crystals based MOS memory and effects of traps on charge storage characteristics Nonlinear modeling of 4 W 12 mm multi-cell microwave power GaAs MESFET Thermally excited micromechanical vacuum resonator Electrochemical etching used on UHV/CVD epitaxial thin films The reduction of base resistance of SiGe/Si HBT via ion implantation and side-wall oxide self-aligned technique
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1