外延InGaAsP/InP层的无损厚度映射

B. Sartorius, M. Brandstattner
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引用次数: 2

摘要

提出了一种基于光吸收测量的快速无损厚度映射新技术。描述了一种实验装置,该装置通过双波长排列消除了未指定的损耗,提高了精度和稳定性。获得了较高的分辨率和速度。对InGaAsP/InP外延层的测试结果表明,该方法能够检测到10纳米范围内的厚度变化。可以选择性地测量异质结构内部的埋藏层
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Nondestructive thickness mapping of epitaxial InGaAsP/InP layers
A new technique for fast and nondestructive thickness mapping based on optical absorption measurements is presented. An experimental setup in which unspecified losses are eliminated by a two-wavelength arrangement and precision and stability are improved is described. High resolution and speed are obtained. Results for InGaAsP/InP epitaxial layers demonstrate the capability to detect thickness variations in the 10-nm range. Buried layers inside heterostructures can be measured selectively.<>
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