基于tsv的3d - ic中的去耦电容堆叠芯片(DCSC)

Eunseok Song, Kyoungchoul Koo, Myunghoi Kim, J. Pak, Joungho Kim
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引用次数: 0

摘要

本文介绍了一种具有离散电容和通硅过孔(tsv)的新型去耦电容堆叠芯片(DCSC),它可以克服传统去耦电容解决方案的局限性,如昂贵的片上NMOS电容和封装级窄带离散去耦电容。所提出的基于tsv的DCSC的关键思想是将去耦电容器(如硅基NMOS电容器和分立电容器)安装在芯片背面,并通过tsv将电容器连接到片上PDN。因此,基于tsv的DCSC通过片上PDN和去耦电容之间的短互连提供最低的寄生电感(ESL:在几十pH以下),并通过将额外的去耦电容堆叠到3D-IC系统中提供最大的电容(高达几uF)。
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Decoupling capacitor stacked chip (DCSC) in TSV-based 3D-ICs
In this paper, we introduce a new decoupling capacitor stacked chip (DCSC) with discrete capacitors and through-silicon-vias (TSVs) that can overcome the limitations of the conventional decoupling capacitor solutions such as expensive on-chip NMOS capacitor and package-level discrete decoupling capacitor with narrow-band. The key idea of the proposed TSV-based DCSC is mounting the decoupling capacitors such as silicon-based NMOS capacitor and discrete capacitor on the backside of a chip and connecting the capacitors to the on-chip PDN through TSVs. Therefore, the TSV-based DCSC provides the lowest parasitic inductance (ESL: under several tens pH) through a short interconnections between the on-chip PDN and decoupling capacitors as well as the largest capacitance (up to several uF) by stacking the additional decoupling capacitors to 3D-IC systems.
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