基于全解析模型的轻掺杂肖特基势垒dg - mosfet源极/漏极载流子隧穿二维分析

M. Schwarz, T. Holtij, A. Kloes, B. Iñíguez
{"title":"基于全解析模型的轻掺杂肖特基势垒dg - mosfet源极/漏极载流子隧穿二维分析","authors":"M. Schwarz, T. Holtij, A. Kloes, B. Iñíguez","doi":"10.1109/ULIS.2011.5758014","DOIUrl":null,"url":null,"abstract":"A new approach to estimate the tunneling current in SB-DG-MOSFETs by applying 2D analytical solutions for the electric field and the electrostatic potential is used to analyze the current contribution. Here, the main focus on the tunneling current. 2D analysis shows a two dimensional influence on the tunneling current, which tunneling probabilty is estimated with the Wentzel-Kramers-Brillouin (WKB) approximation. Thermionic emission is calculated as well with the 2D analytical solutions. A comparison of the tunneling and thermionic current with TCAD Sentaurus was made for channel lengths down to 65nm.","PeriodicalId":146779,"journal":{"name":"Ulis 2011 Ultimate Integration on Silicon","volume":"46 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2011-03-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":"{\"title\":\"2D Analysis of source/drain carrier tunneling in lightly doped Schottky barrier DG-MOSFETs using a fully analytical model\",\"authors\":\"M. Schwarz, T. Holtij, A. Kloes, B. Iñíguez\",\"doi\":\"10.1109/ULIS.2011.5758014\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A new approach to estimate the tunneling current in SB-DG-MOSFETs by applying 2D analytical solutions for the electric field and the electrostatic potential is used to analyze the current contribution. Here, the main focus on the tunneling current. 2D analysis shows a two dimensional influence on the tunneling current, which tunneling probabilty is estimated with the Wentzel-Kramers-Brillouin (WKB) approximation. Thermionic emission is calculated as well with the 2D analytical solutions. A comparison of the tunneling and thermionic current with TCAD Sentaurus was made for channel lengths down to 65nm.\",\"PeriodicalId\":146779,\"journal\":{\"name\":\"Ulis 2011 Ultimate Integration on Silicon\",\"volume\":\"46 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2011-03-14\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"4\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Ulis 2011 Ultimate Integration on Silicon\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ULIS.2011.5758014\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Ulis 2011 Ultimate Integration on Silicon","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ULIS.2011.5758014","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 4

摘要

本文采用二维电场解析解和静电势解析解来估计sb - dg - mosfet的隧道电流贡献。这里,主要关注的是隧穿电流。二维分析显示了隧穿电流的二维影响,用WKB近似估计了隧穿概率。用二维解析解计算了热离子发射。在通道长度小于65nm的情况下,与TCAD Sentaurus进行了隧道和热离子电流的比较。
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2D Analysis of source/drain carrier tunneling in lightly doped Schottky barrier DG-MOSFETs using a fully analytical model
A new approach to estimate the tunneling current in SB-DG-MOSFETs by applying 2D analytical solutions for the electric field and the electrostatic potential is used to analyze the current contribution. Here, the main focus on the tunneling current. 2D analysis shows a two dimensional influence on the tunneling current, which tunneling probabilty is estimated with the Wentzel-Kramers-Brillouin (WKB) approximation. Thermionic emission is calculated as well with the 2D analytical solutions. A comparison of the tunneling and thermionic current with TCAD Sentaurus was made for channel lengths down to 65nm.
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