电离辐射对不同布局结构PD-SOI器件泄漏电流的影响

Liu Yuan, He Yu-juan, En Yun-fei, Shi Qian
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引用次数: 1

摘要

研究了不同布局结构的部分耗尽型SOI器件中漏电流的总剂量依赖性。实验结果表明,标准结构的PD-SOI器件的漏电流受沟槽侧壁漏电流的影响较大,而封闭栅极和H栅极结构的漏电流受后门寄生晶体管导通和栅极感应漏电流的影响较大。
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Ionizing radiation induced leakage current in the PD-SOI devices with different layout structures
Total dose dependence of leakage current in the partially depleted SOI devices with different layout structures are presented. The experimental results show that the leakage currents in the irradiated PD-SOI device with standard structure are significant affected by trench sidewall leakage, but the leakage currents in the enclosed gate and H gate structures are more affected by the conduction of back gate parasitic transistor and gate induced drain leakage currents.
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