用于高速、低功耗电路应用的基于inp的hemt

I. Adesida, A. Mahajan, G. Cueva
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引用次数: 3

摘要

描述了在晶格匹配的InP材料体系中增强模式和耗尽模式hemt (E/ d - hemt)的单片集成过程。采用埋入式Pt栅极技术,证明了0.3 /spl mu/m栅极长度的e- hemt具有+167 mV的阈值电压和700 mS/mm的最大外部跨导。给出了相应器件参数为-443 mV和462 mS/mm的d - hemt。这些器件获得了超过95 GHz的统一电流增益截止频率。在基于E- hemt和d - hemt的直接耦合场效应管逻辑技术中实现了一个除以4的预量器。
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InP-based HEMTs for high speed, low power circuit applications
Processes for the monolithic integration of enhancement- and depletion-mode HEMTs (E/D-HEMTs) in the lattice matched InP material system are described. Using the buried Pt gate technology, 0.3 /spl mu/m gate-length E-HEMTs exhibiting a threshold voltage of +167 mV and a maximum extrinsic transconductance, g/sub mext/, of 700 mS/mm are demonstrated. D-HEMTs with corresponding device parameters of -443 mV and 462 mS/mm are presented. Unity current gain cut-off frequencies of-over 95 GHz were obtained for these devices. Implementation of a divide-by-four prescaler in the direct coupled FET logic technology based on E- and D-HEMTs is demonstrated.
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