45纳米高k +金属栅极SRAM器件在地面和空间环境下的多单元破坏概率

N. Seifert, B. Gill, K. Foley, P. Relangi
{"title":"45纳米高k +金属栅极SRAM器件在地面和空间环境下的多单元破坏概率","authors":"N. Seifert, B. Gill, K. Foley, P. Relangi","doi":"10.1109/RELPHY.2008.4558882","DOIUrl":null,"url":null,"abstract":"Multi-cell soft errors are a key reliability concern for advanced memory devices. We have investigated single-bit (SBU) and multi-cell upset (MCU) rates of SRAM devices built in a 45 nm high-k + metal gate (HK+MG) technology under neutron, proton and heavy-ion radiation. Our data highlight the excellent soft error reliability scaling properties of HK+MG. MCU rates were kept at 10% or less of SBU ones and bit-level SBU rates continue to decrease 2times per technology generation for terrestrial applications. SRAM upset rates in orbit are projected to be 2 to 4 orders of magnitude higher than at sea-level. A dramatic increase in MCU rates relative to SBU is projected for geosynchronous orbits, where direct ionization by heavy-ions dominates. No indication of charge amplification by parasitic bipolar devices has been observed for all investigated radiation environments. The observation that SBU error rates and small MCU error rates are elevated at locations in close proximity to well contacts for high LET values is speculated to be the result of the formation of a funnel between well contacts and sensitive drains.","PeriodicalId":187696,"journal":{"name":"2008 IEEE International Reliability Physics Symposium","volume":"41 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2008-07-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"91","resultStr":"{\"title\":\"Multi-cell upset probabilities of 45nm high-k + metal gate SRAM devices in terrestrial and space environments\",\"authors\":\"N. Seifert, B. Gill, K. Foley, P. Relangi\",\"doi\":\"10.1109/RELPHY.2008.4558882\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Multi-cell soft errors are a key reliability concern for advanced memory devices. We have investigated single-bit (SBU) and multi-cell upset (MCU) rates of SRAM devices built in a 45 nm high-k + metal gate (HK+MG) technology under neutron, proton and heavy-ion radiation. Our data highlight the excellent soft error reliability scaling properties of HK+MG. MCU rates were kept at 10% or less of SBU ones and bit-level SBU rates continue to decrease 2times per technology generation for terrestrial applications. SRAM upset rates in orbit are projected to be 2 to 4 orders of magnitude higher than at sea-level. A dramatic increase in MCU rates relative to SBU is projected for geosynchronous orbits, where direct ionization by heavy-ions dominates. No indication of charge amplification by parasitic bipolar devices has been observed for all investigated radiation environments. The observation that SBU error rates and small MCU error rates are elevated at locations in close proximity to well contacts for high LET values is speculated to be the result of the formation of a funnel between well contacts and sensitive drains.\",\"PeriodicalId\":187696,\"journal\":{\"name\":\"2008 IEEE International Reliability Physics Symposium\",\"volume\":\"41 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2008-07-09\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"91\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2008 IEEE International Reliability Physics Symposium\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/RELPHY.2008.4558882\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2008 IEEE International Reliability Physics Symposium","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/RELPHY.2008.4558882","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 91

摘要

多单元软错误是高级存储设备可靠性的一个关键问题。本文研究了在中子、质子和重离子辐射下,采用45 nm高k +金属栅(HK+MG)技术构建的SRAM器件的单比特(SBU)和多单元扰流率(MCU)。我们的数据突出了HK+MG优异的软误差可靠性缩放特性。MCU速率保持在SBU速率的10%或更低,而在地面应用中,比特级SBU速率每一代技术继续降低2倍。轨道上的SRAM扰动率预计比海平面高2到4个数量级。预计在重离子直接电离占主导地位的地球同步轨道上,MCU速率相对于SBU将急剧增加。在所有研究的辐射环境中,没有观察到寄生双极器件的电荷放大迹象。观察到SBU错误率和小MCU错误率在靠近井触点的位置升高,因为高LET值,推测这是由于在井触点和敏感排水道之间形成漏斗的结果。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
Multi-cell upset probabilities of 45nm high-k + metal gate SRAM devices in terrestrial and space environments
Multi-cell soft errors are a key reliability concern for advanced memory devices. We have investigated single-bit (SBU) and multi-cell upset (MCU) rates of SRAM devices built in a 45 nm high-k + metal gate (HK+MG) technology under neutron, proton and heavy-ion radiation. Our data highlight the excellent soft error reliability scaling properties of HK+MG. MCU rates were kept at 10% or less of SBU ones and bit-level SBU rates continue to decrease 2times per technology generation for terrestrial applications. SRAM upset rates in orbit are projected to be 2 to 4 orders of magnitude higher than at sea-level. A dramatic increase in MCU rates relative to SBU is projected for geosynchronous orbits, where direct ionization by heavy-ions dominates. No indication of charge amplification by parasitic bipolar devices has been observed for all investigated radiation environments. The observation that SBU error rates and small MCU error rates are elevated at locations in close proximity to well contacts for high LET values is speculated to be the result of the formation of a funnel between well contacts and sensitive drains.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Degradation effects in a-Si:H thin film transistors and their impact on circuit performance High-robust ESD protection structure with embedded SCR in high-voltage CMOS process New insight into tantalum pentoxide Metal-Insulator-Metal (MIM) capacitors: Leakage current modeling, self-heating, reliability assessment and industrial applications Electron energy loss spectrum application for failure mechanism investigation in semiconductor failure analysis Characterization of stress-voiding of Cu / Low-k vias attached to narrow lines
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1