200mm Si衬底上转移键合GaN薄膜的应力和晶圆翘曲分析

M. Lofrano, N. Pham, M. Rosmeulen, P. Soussan
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引用次数: 4

摘要

本文采用有限元方法研究了GaN LED在200mm硅片上衬底转移过程中引起的晶圆弯曲。衬底转移工艺是利用永久键合层将薄GaN LED器件层转移到载流子晶圆上。在这项工作中,对两种不同的键合材料,金属CuSn合金和苯并环丁烯(BCB)聚合物进行了基准测试。在工艺过程中控制晶圆弯曲非常重要,因为过高的晶圆弯曲值可能会对进一步的工艺步骤造成问题,此外还会影响光刻等工艺质量,并可能对器件可靠性构成威胁。发现在衬底转移过程中,晶圆弯曲发生了变化。金属粘合材料在基材转移过程结束时引入高弓值。金属结合材料的不同组成影响最终的晶圆弯曲。
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Stress and wafer warpage analysis of GaN thin film induced by transfer bonding process on 200mm Si substrate
In this paper we used Finite Element Modeling (FEM) to investigate the wafer bow induced during the substrate transfer process for GaN LED on 200mm silicon wafer. The substrate transfer process is to transfer the thin GaN LED device layer to a carrier wafer using a permanent bonding layer. In this work two different bonding materials were benchmarked, a metallic CuSn alloy and a Benzocyclobutene (BCB) polymer. It is important to control the wafer bow during the process because the high wafer bow value may cause problem for further process steps, besides it affects process quality such as in lithography and can be a threat to the device reliability. It was found that the wafer bow changes during substrate transfer process. Metallic bond material introduces high bow values at the end of the substrate transfer process. Different compositions of metallic bond material inlfuence the final wafer bow.
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