激光照射下紫外熔融石英玻片的脱羟基化

A. Fernandes, D. Kane, B. Gong, R. Lamb
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引用次数: 0

摘要

紫外(UV)激光处理熔融石英玻璃的研究取得了进一步的进展。存在于表面的羟基可以通过处理去除。表面羟基影响二氧化硅在催化、色谱、光电子和微电子等领域的表面粘附和性能。这项工作表明,通过激光照射去羟基化是一个热过程。一种使用质谱法的分析技术已经被开发出来,以阐明和避免碳氢化合物污染的影响,允许进行系统的去羟基化测量。
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Dehydroxylation of UV fused silica slides via laser irradiation
Further advances have been made in the development and understanding of an ultraviolet (UV) laser treatment of fused silica glass. Hydroxyl groups present on the surface can be removed by the treatment. The surface hydroxyl groups affect the surface adhesion and performance of silica in catalysis, chromatography, photonics and microelectronics. This work shows that dehydroxylation via laser irradiation is a thermal process. An analysis technique using mass spectrometry has been developed to elucidate and avoid the effect of hydrocarbon contamination, allowing systematic measurements of dehydroxylation to be performed.
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