多晶硅发射极双极晶体管中的热载子效应

D. Burnett, C. Hu
{"title":"多晶硅发射极双极晶体管中的热载子效应","authors":"D. Burnett, C. Hu","doi":"10.1109/BIPOL.1988.51054","DOIUrl":null,"url":null,"abstract":"The degradation of self-aligned, polysilicon emitter transistors is described for a wide range of constant current stress on several device sizes. The experimental results indicate that Delta I/sub B/ can be expressed as AQ/sup n/, with n=0.5 for these devices. Except for large values of I/sub R/, A varies in a power-lay fashion with I/sub R/. The dependence of Delta I/sub B/ upon the forward current at which the device is operating can be expressed as A=BJ/sup gamma //sub C/. It is observed that n is characteristic of all devices and stress currents, B is constant for a given device size, and gamma varies with device size and reverse current.<<ETX>>","PeriodicalId":302949,"journal":{"name":"Proceedings of the 1988 Bipolar Circuits and Technology Meeting,","volume":"48 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1988-09-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Hot-carrier effects in polysilicon emitter bipolar transistors\",\"authors\":\"D. Burnett, C. Hu\",\"doi\":\"10.1109/BIPOL.1988.51054\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The degradation of self-aligned, polysilicon emitter transistors is described for a wide range of constant current stress on several device sizes. The experimental results indicate that Delta I/sub B/ can be expressed as AQ/sup n/, with n=0.5 for these devices. Except for large values of I/sub R/, A varies in a power-lay fashion with I/sub R/. The dependence of Delta I/sub B/ upon the forward current at which the device is operating can be expressed as A=BJ/sup gamma //sub C/. It is observed that n is characteristic of all devices and stress currents, B is constant for a given device size, and gamma varies with device size and reverse current.<<ETX>>\",\"PeriodicalId\":302949,\"journal\":{\"name\":\"Proceedings of the 1988 Bipolar Circuits and Technology Meeting,\",\"volume\":\"48 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1988-09-12\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings of the 1988 Bipolar Circuits and Technology Meeting,\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/BIPOL.1988.51054\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of the 1988 Bipolar Circuits and Technology Meeting,","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/BIPOL.1988.51054","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

摘要

描述了自对准多晶硅发射极晶体管在多种器件尺寸上的大范围恒流应力下的退化。实验结果表明,Delta I/sub B/可以表示为AQ/sup n/,对于这些器件,n=0.5。除了较大的I/sub R/外,A随I/sub R/的功率分布而变化。δ I/sub B/对器件工作的正向电流的依赖性可以表示为A=BJ/sup γ //sub C/。可以观察到,n是所有器件和应力电流的特征,B对于给定器件尺寸是恒定的,伽马随器件尺寸和反向电流而变化。
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Hot-carrier effects in polysilicon emitter bipolar transistors
The degradation of self-aligned, polysilicon emitter transistors is described for a wide range of constant current stress on several device sizes. The experimental results indicate that Delta I/sub B/ can be expressed as AQ/sup n/, with n=0.5 for these devices. Except for large values of I/sub R/, A varies in a power-lay fashion with I/sub R/. The dependence of Delta I/sub B/ upon the forward current at which the device is operating can be expressed as A=BJ/sup gamma //sub C/. It is observed that n is characteristic of all devices and stress currents, B is constant for a given device size, and gamma varies with device size and reverse current.<>
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The best-case power-delay products for polysilicon-contacted bipolar-transistor gates. A theoretical study The effect of emitter sidewall isolation on the emitter junction in a double layer polysilicon bipolar process Delay analysis for BiCMOS drivers Comparing techniques for fabrication polysilicon contacted emitter bipolar transistors Thin base formation by double diffused polysilicon technology
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