新一代晶圆级封装应用的新型表面光洁度

Kunal Shah
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引用次数: 1

摘要

半导体行业的晶圆级封装(WLP)继续增长,特别是在物联网、高速/移动、传感器、可穿戴设备、汽车和其他关键应用领域。这些市场对产品的要求包括占地面积更小,性能最佳,具有成本效益和可靠性。WLP材料/化学品是帮助半导体制造商、oem达到这些要求以实现最佳性能的关键组件。其中最重要的材料包括铜的表面光洁度,以支持互连集成。高频,高密度下一代WLP应用的表面光洁度选择标准包括最小的插入损耗,长保质期,成本效益和高可靠性。市面上的选择(ImAg、EPIG、EPAG、DIG、OSP等)很少;然而,在满足下一代应用程序的所有需求方面存在一些问题。一种创新的无镍方法涉及一种专有的纳米工程屏障,设计用于覆盖铜触点,并在最外层镀上一层金,显示出比同时代人优越的优势。将对可靠性试验结果进行讨论,比较新型表面处理的性能效益。
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Novel Surface Finish for Next Generation Wafer Level Packaging Applications
Wafer level packaging (WLP) in the semiconductor industry continues to grow especially in the areas of IOT, high speed/mobility, sensors, wearables, automotive and other critical applications. The requirements of the products from these markets include smaller footprint, perform optimally-electrically, cost-effective and reliable. WLP materials/chemistries are critical components in helping semiconductor manufacturers, OEMs to attain these requirements to achieve the best performance. One of the most important materials include surface finish on the copper features to support interconnect integration. The selection criteria of surface finish for high frequency, high density next generation WLP applications involve minimal insertion loss, long shelf life, cost-effective and high reliability. There are few options (ImAg, EPIG, EPAG, DIG, OSP, etc.) available in the market; however, there are concerns over fulfilling all the requirements for next generation applications. An innovative nickel-less approach involving a proprietary nano-engineered barrier designed to coat copper contacts, finished with an outermost gold layer has shown superior benefits over contemporaries. Reliability testing results will be discussed comparing performance benefit of novel surface finish.
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