气团离子束辐照用于晶圆键合

N. Toyoda, Tomoya Sasaki, S. Ikeda, I. Yamada
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引用次数: 0

摘要

进行了气团离子束辐照键合硅片的初步实验。GCIB独特的辐照效应,如低损伤辐照和表面光滑效应,将有利于表面活化键合。从XPS, AFM测量中,斜入射Ar-GCIB辐射有效地去除Cu膜上的天然氧化物,而不会使其变粗。随着Ar-GCIB加速电压的增加,Cu-Cu键增加。由于表面平滑和Ar-GCIB去除氧化物而导致的接触角减小与结合强度之间存在相关性。
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Gas cluster ion beam irradiation for wafer bonding
Preliminary experiments of gas cluster ion beam (GCIB) irradiation for wafer bonding were conducted. Unique irradiation effects of GCIB, such as low-damage irradiation and surface smoothing effects, will be beneficial for surface activated bonding. From XPS, AFM measurements, Ar-GCIB irradiation at oblique incidence removed native oxide on Cu films efficiently without roughening. Cu-Cu bond increased with the acceleration voltage of Ar-GCIB. There is a correlation between the bond strength and the contact angle reduction due to surface smoothing and oxide removal by Ar-GCIB.
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