L. Orlov, V. A. Tolomasov, A. Potapov, Y. Drozdov, V. Vdovin
{"title":"GeH/sub - 4/-Si MBE在Si(100)衬底上异质外延Ge-Si/sub - 1-x/Ge/sub -x/超晶格","authors":"L. Orlov, V. A. Tolomasov, A. Potapov, Y. Drozdov, V. Vdovin","doi":"10.1109/SIM.1996.570942","DOIUrl":null,"url":null,"abstract":"We applied GeH/sub 4/-Si MBE for growing Ge-Si/sub 1-x/Ge/sub x/ superlattices on Si(100). We investigated the distribution and the structure of defects inside heteroepitaxial Si/sub 1-x/Ge/sub x/ layers grown on Si(100). It was shown that the system has unique peculiarities of a dislocation structure formation. We found out that the plastic deformation on a layer-substrate heteroboundary eliminates strong elastic deformation inside the grown layer.","PeriodicalId":391894,"journal":{"name":"Proceedings of Semiconducting and Semi-Insulating Materials Conference","volume":"31 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1996-04-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Heteroepitaxy of Ge-Si/sub 1-x/Ge/sub x/ superlattices on Si (100) substrates by GeH/sub 4/-Si MBE\",\"authors\":\"L. Orlov, V. A. Tolomasov, A. Potapov, Y. Drozdov, V. Vdovin\",\"doi\":\"10.1109/SIM.1996.570942\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We applied GeH/sub 4/-Si MBE for growing Ge-Si/sub 1-x/Ge/sub x/ superlattices on Si(100). We investigated the distribution and the structure of defects inside heteroepitaxial Si/sub 1-x/Ge/sub x/ layers grown on Si(100). It was shown that the system has unique peculiarities of a dislocation structure formation. We found out that the plastic deformation on a layer-substrate heteroboundary eliminates strong elastic deformation inside the grown layer.\",\"PeriodicalId\":391894,\"journal\":{\"name\":\"Proceedings of Semiconducting and Semi-Insulating Materials Conference\",\"volume\":\"31 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1996-04-29\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings of Semiconducting and Semi-Insulating Materials Conference\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/SIM.1996.570942\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of Semiconducting and Semi-Insulating Materials Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SIM.1996.570942","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Heteroepitaxy of Ge-Si/sub 1-x/Ge/sub x/ superlattices on Si (100) substrates by GeH/sub 4/-Si MBE
We applied GeH/sub 4/-Si MBE for growing Ge-Si/sub 1-x/Ge/sub x/ superlattices on Si(100). We investigated the distribution and the structure of defects inside heteroepitaxial Si/sub 1-x/Ge/sub x/ layers grown on Si(100). It was shown that the system has unique peculiarities of a dislocation structure formation. We found out that the plastic deformation on a layer-substrate heteroboundary eliminates strong elastic deformation inside the grown layer.