GeH/sub - 4/-Si MBE在Si(100)衬底上异质外延Ge-Si/sub - 1-x/Ge/sub -x/超晶格

L. Orlov, V. A. Tolomasov, A. Potapov, Y. Drozdov, V. Vdovin
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引用次数: 1

摘要

我们应用GeH/sub 4/-Si MBE在Si(100)上生长Ge-Si/sub 1-x/Ge/sub x/超晶格。我们研究了在Si(100)上生长的异质外延Si/sub - 1-x/Ge/sub -x/层内缺陷的分布和结构。结果表明,该体系具有位错结构形成的独特特性。我们发现,层-衬底异质边界上的塑性变形消除了生长层内部的强弹性变形。
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Heteroepitaxy of Ge-Si/sub 1-x/Ge/sub x/ superlattices on Si (100) substrates by GeH/sub 4/-Si MBE
We applied GeH/sub 4/-Si MBE for growing Ge-Si/sub 1-x/Ge/sub x/ superlattices on Si(100). We investigated the distribution and the structure of defects inside heteroepitaxial Si/sub 1-x/Ge/sub x/ layers grown on Si(100). It was shown that the system has unique peculiarities of a dislocation structure formation. We found out that the plastic deformation on a layer-substrate heteroboundary eliminates strong elastic deformation inside the grown layer.
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