硼注入预非晶硅的多脉冲激光退火及工艺优化

The Fourth International Workshop on Junction Technology, 2004. IWJT '04. Pub Date : 2004-03-15 DOI:10.1109/IWJT.2004.1306749

B. Cho, D. Poon, L. Tan, M. Bhat, A. See

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引用次数: 1

摘要

介绍了能量适中的多脉冲激光热退火(LTA)对预非晶硅的优点。研究了激光退火硼结在后续RTA过程中的再分布。提出了一种优化多脉冲LTA条件的方法。结果表明，霍尔分析可以作为一种快速评估连接完整性的工具。

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Multiple-pulse laser annealing of boron-implanted preamorphized silicon and the process optimization

Advantages of multiple-pulse Laser Thermal Annealing (LTA) with a moderate energy fluence on preamorphized silicon are described. Re-distribution of laser annealed boron junction during subsequent RTA is also studied. A method to optimize the multiple-pulse LTA condition is proposed. It is also demonstrated that Hall analysis can be used as a quick evaluation tool of the integrity of the junctions.

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The Fourth International Workshop on Junction Technology, 2004. IWJT '04.

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