甲醛基化学镀铜的镀通孔可靠性研究

T. Śleboda
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摘要

随着化学沉积的增长,了解多层板(MLB)应用中甲醛基化学镀工艺的需求变得越来越重要。这项工作的目的是了解确保电镀通孔(PTHs)中可靠,无裂纹的化学铜的条件。这是通过将多个加工和电镀变量与实际mlb中的PTH裂纹相关联来实现的。采用实验设计(DOE)和统计分析的方法,了解PTH开裂的最重要工艺和电镀条件。结果表明,裂纹不仅受镀层厚度和PTH直径的影响,还受镀液中甲醛(HCHO)浓度的影响。这些结果表明,严格遵守镀液浓度对确保无裂纹PTHs的影响最大。此外,对实验中化学镀铜箔的微观组织进行了分析,并与开裂进行了关联。通过高温拉伸试验(250/spl℃)发现,裂纹较多的PTHs中铜的组织中存在气孔,认为这是析氢所致,断口区域的韧窝增加,塑性变形减小。
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A study of plated through-hole reliability of formaldehyde-based electroless copper depositions
With the growth of electroless depositions, the need to understand the formaldehyde-based electroless plating process in multi-layer board (MLB) applications is becoming increasingly important. The purpose of this work is to understand the conditions that insure reliable, crack-free electroless copper in plated through-holes (PTHs). This is accomplished by correlating multiple processing and plating variables to PTH cracking in actual MLBs. A design of experiment (DOE) and statistical analysis was employed to understand the most important processing and plating conditions on PTH cracking. It was found that cracking is not only affected by plating thickness and PTH diameter, but also by plating bath variables such as formaldehyde (HCHO) concentration. These results indicate that a strict adherence to plating bath concentrations had the largest effect on insuring crack-free PTHs. In addition, the microstructure of the electroless copper foils in this experiment was analyzed and correlated to cracking. It was found that the copper from the PTHs with more cracking had voids in the microstructure, believed to originate from hydrogen evolution, increased dimpling and less plastic deformation in the region of the fracture surface from elevated temperature (250/spl deg/C) tensile testing.
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