微电子领域的教育、研究和工业基础设施——全球展望和印度展望

B. Courtois, K. Torki, S. Dumont, S. Eyraud, J.-F. Paillotin, G. D. Pendina
{"title":"微电子领域的教育、研究和工业基础设施——全球展望和印度展望","authors":"B. Courtois, K. Torki, S. Dumont, S. Eyraud, J.-F. Paillotin, G. D. Pendina","doi":"10.1109/VLSI.Design.2009.17","DOIUrl":null,"url":null,"abstract":"Infrastructures to provide access to custom integrated hardware manufacturing facilities are important because they allow Students and Researchers to access professional facilities at a reasonable cost, and they allow Companies to access small volume production, otherwise difficult to obtain directly from manufacturers. This paper is reviewing the most recent developments at CMP like the introduction of a CMOS 45nm process, the cooperation between the major infrastructures services available worldwide and recent developments w.r.t. India. The conclusion is addressing technical developments as well as considerations like globalization and excellence.","PeriodicalId":267121,"journal":{"name":"2009 22nd International Conference on VLSI Design","volume":"155 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2009-01-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Infrastructures for Education, Research and Industry in Microelectronics A Look Worldwide and a Look at India\",\"authors\":\"B. Courtois, K. Torki, S. Dumont, S. Eyraud, J.-F. Paillotin, G. D. Pendina\",\"doi\":\"10.1109/VLSI.Design.2009.17\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Infrastructures to provide access to custom integrated hardware manufacturing facilities are important because they allow Students and Researchers to access professional facilities at a reasonable cost, and they allow Companies to access small volume production, otherwise difficult to obtain directly from manufacturers. This paper is reviewing the most recent developments at CMP like the introduction of a CMOS 45nm process, the cooperation between the major infrastructures services available worldwide and recent developments w.r.t. India. The conclusion is addressing technical developments as well as considerations like globalization and excellence.\",\"PeriodicalId\":267121,\"journal\":{\"name\":\"2009 22nd International Conference on VLSI Design\",\"volume\":\"155 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2009-01-05\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2009 22nd International Conference on VLSI Design\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/VLSI.Design.2009.17\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2009 22nd International Conference on VLSI Design","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/VLSI.Design.2009.17","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

提供定制集成硬件制造设施的基础设施很重要,因为它们允许学生和研究人员以合理的成本使用专业设施,并且它们允许公司进行小批量生产,否则很难直接从制造商那里获得。本文回顾了CMP的最新发展,如CMOS 45纳米工艺的引入,全球主要基础设施服务之间的合作以及印度的最新发展。结论涉及技术发展以及全球化和卓越等考虑因素。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
Infrastructures for Education, Research and Industry in Microelectronics A Look Worldwide and a Look at India
Infrastructures to provide access to custom integrated hardware manufacturing facilities are important because they allow Students and Researchers to access professional facilities at a reasonable cost, and they allow Companies to access small volume production, otherwise difficult to obtain directly from manufacturers. This paper is reviewing the most recent developments at CMP like the introduction of a CMOS 45nm process, the cooperation between the major infrastructures services available worldwide and recent developments w.r.t. India. The conclusion is addressing technical developments as well as considerations like globalization and excellence.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
DFX and Productivity Design of a Low Power, Variable-Resolution Flash ADC Switched-Capacitor Based Buck Converter Design Using Current Limiter for Better Efficiency and Output Ripple Synthesis & Testing for Low Power A Novel Approach for Improving the Quality of Open Fault Diagnosis
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1