{"title":"光刻胶显影剂回收技术及系统","authors":"H. Sugawara, Y. Tajima, T. Ohmi","doi":"10.1109/ISSM.2001.963020","DOIUrl":null,"url":null,"abstract":"A tetramethylammonium hydroxide (TMAH) generally used as photoresist developer for manufacturing LSIs and LCDs is recovered from developer waste (spent developer) using an electrodialysis (ED) method, and purified by ion exchange (IE) technologies. Reclaimed developer features analytically the same purity as commercial fresh one. This reclamation system can achieve a stably high TMAH recovery rate of more than 80%. Furthermore, it has the great advantages of saving operating costs, which amounts to 66.2% (for LSI) and 78.3% (for LCD) total cost reduction compared with conventional no reclamation system in a case study, as well as reducing environmental load.","PeriodicalId":356225,"journal":{"name":"2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. Conference Proceedings (Cat. No.01CH37203)","volume":"16 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2001-10-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Photoresist developer reclamation technology and system\",\"authors\":\"H. Sugawara, Y. Tajima, T. Ohmi\",\"doi\":\"10.1109/ISSM.2001.963020\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A tetramethylammonium hydroxide (TMAH) generally used as photoresist developer for manufacturing LSIs and LCDs is recovered from developer waste (spent developer) using an electrodialysis (ED) method, and purified by ion exchange (IE) technologies. Reclaimed developer features analytically the same purity as commercial fresh one. This reclamation system can achieve a stably high TMAH recovery rate of more than 80%. Furthermore, it has the great advantages of saving operating costs, which amounts to 66.2% (for LSI) and 78.3% (for LCD) total cost reduction compared with conventional no reclamation system in a case study, as well as reducing environmental load.\",\"PeriodicalId\":356225,\"journal\":{\"name\":\"2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. Conference Proceedings (Cat. No.01CH37203)\",\"volume\":\"16 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2001-10-08\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. Conference Proceedings (Cat. No.01CH37203)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ISSM.2001.963020\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. Conference Proceedings (Cat. No.01CH37203)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISSM.2001.963020","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Photoresist developer reclamation technology and system
A tetramethylammonium hydroxide (TMAH) generally used as photoresist developer for manufacturing LSIs and LCDs is recovered from developer waste (spent developer) using an electrodialysis (ED) method, and purified by ion exchange (IE) technologies. Reclaimed developer features analytically the same purity as commercial fresh one. This reclamation system can achieve a stably high TMAH recovery rate of more than 80%. Furthermore, it has the great advantages of saving operating costs, which amounts to 66.2% (for LSI) and 78.3% (for LCD) total cost reduction compared with conventional no reclamation system in a case study, as well as reducing environmental load.
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