低功耗硅与GaAs MOSFET的设计与比较分析

IF 0.6 4区 工程技术 Q4 ENGINEERING, ELECTRICAL & ELECTRONIC Journal of Nanoelectronics and Optoelectronics Pub Date : 2023-08-01 DOI:10.1166/jno.2023.3460
Rajdevinder Kaur Sidhu, Jagpal Singh Ubhi, Alpana Agarwal, Balwinder Raj
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引用次数: 0

摘要

现代电子设备对低功耗的需求导致了各种技术的发展,包括使用不同的材料,如Si和GaAs。在本文中,我们提出了一种用于低功率应用的Si和GaAs mosfet的设计和比较分析。分析包括两个器件的电气特性、性能参数和功耗。利用TCAD工具对Si MOSFET和GaAs MOSFET进行了仿真和分析,并对结果进行了比较。仿真结果表明,与Si MOSFET相比,GaAs MOSFET具有更高的跨导率(gm)。然而,在低工作频率下,Si MOSFET具有较低的栅漏电流(Ig)和较低的功耗。我们还研究了缩放对两种mosfet的性能和功耗的影响。结果表明,缩放提高了两种器件的性能,但功耗随着器件尺寸的减小而增加。对于低功率应用的Si和GaAs MOSFET的比较分析为选择适合特定应用的MOSFET技术提供了有用的见解。结果表明,Si和GaAs mosfet都有各自的优点和缺点,选择取决于应用需求。
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Design and Comparative Analysis of Silicon and GaAs MOSFET for Low Power Applications
The demand for low power consumption in modern electronic devices has led to the development of various technologies, including usage of different materials such as Si and GaAs. In this paper, we present a design and comparative analysis of Si and GaAs MOSFETs for low power applications. The analysis includes the electrical characteristics, performance parameters, and power consumption of both devices. The Si MOSFET and GaAs MOSFET are simulated and analyzed using TCAD tools, and the results are compared. The simulation results show that the GaAs MOSFET has a higher transconductance (gm) compared to the Si MOSFET. However, the Si MOSFET has a lower gate leakage current (Ig) and lower power consumption at low operating frequencies. We also investigate the effect of scaling on the performance and power consumption of both MOSFETs. The results show that scaling improves the performance of both devices, but the power consumption increases as the device dimensions are reduced. The comparative analysis of Si and GaAs MOSFETs for low power applications provides useful insights into the selection of suitable MOSFET technology for specific applications. The results show that both Si and GaAs MOSFETs have their advantages and disadvantages, and the choice depends on the application requirements.
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来源期刊
Journal of Nanoelectronics and Optoelectronics
Journal of Nanoelectronics and Optoelectronics 工程技术-工程:电子与电气
自引率
16.70%
发文量
48
审稿时长
12.5 months
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