pecvd -异种生长β-Ga2O3薄膜及温度调制太阳盲紫外光探测研究

Zhaoying Xi, Lili Yang, Zeng Liu, Suhao Yao, Lincong Shu, Maolin Zhang, Shan Li, Yufeng Guo, Weihua Tang
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摘要

利用等离子体增强化学气相沉积(PECVD)技术,在c-plane蓝宝石衬底上,在不同温度下生长出均匀的Ga2O3薄膜,其均方根(RMS)粗糙度低至2.71 nm,生长速率高达1121.30 nm/h;然后详细讨论了其日盲紫外光探测性能。基于不同温度下制备的五种Ga2O3薄膜的金属-半导体-金属(MSM)太阳盲紫外光电探测器显示出在22-168 fA之间的超低暗电流(Idark)。在254 nm紫外光照射下,820℃生长薄膜制备的光电探测器性能最佳,光暗电流比(PDCR)为1.47×105,上升/下降时间为0.067/0.13 s,比探测率(D*)为3.56×1012 Jones,线性动态范围(LDR)为92.89 dB。综上所述,本研究结果为制备低成本、超低噪声的Ga2O3薄膜提供了一种可参考的方法;以及实现体面的太阳盲紫外传感应用。
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Study on the PECVD-hetero-grown β-Ga2O3 thin film and temperature-modulated solar-blind UV photodetection
Abstract Using a convenient and low-cost plasma-enhanced chemical vapor deposition (PECVD) technique, uniform Ga2O3 thin films were hetero-grown on c-plane sapphire substrates at different temperatures, with root mean square (RMS) roughness as low as 2.71 nm and a growth rate of up to 1121.30 nm/h; and then the solar-blind UV photodetection performances were discussed in detail. Metal-semiconductor-metal (MSM) solar-blind UV photodetectors based on the five Ga2O3 films prepared at different temperatures exhibit ultra-low dark currents (Idark) ranging among 22-168 fA. Under the illumination of 254 nm UV light, the photodetector prepared by the film grown at 820 ℃ possesses the highest performance with a high photo-to-dark current ratio (PDCR) of 1.47×105, a low rise/fall time of 0.067/0.13 s, a specific detectivity (D*) of 3.56×1012 Jones, and a linear dynamic range (LDR) of 92.89 dB. In all, the results in this work may well provide a referable method for growing cost-effective and ultralow-noise Ga2O3 thin films; as well as achieving decent solar-blind UV sensing application.
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