大气压氦等离子体射流中工作条件对电子密度的影响

wenwen xu, yonghang lu, xiaofeng Yue, xiaoping liu, Zhengwei Wu
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摘要

近年来,大气压等离子体射流(APPJs)在材料改性、环境修复和生物医学等许多应用领域都具有重要的应用价值。了解这些等离子体射流在各种操作条件下的放电特性对于优化工艺结果至关重要。本文建立了一个二维流体模型,用于数值模拟大气压氦等离子体射流在不同工作条件下的电子密度变化。研究的参数包括氦气流速、电压幅值、针环放电间隙和介电管的相对介电常数。结果表明,电场和电子密度的峰值最初出现在介质管壁上,随后向传播射流的头部移动。气体流速对整个等离子体射流的电子密度影响最小,而增大针环放电间隙会显著降低射流内的平均电子密度。此外,电压幅值和介质管相对介电常数的增加增强了放电空间内的电场,从而增加了等离子体射流中的电子密度。这些发现强调了理解电子密度和操作条件之间的相关性对于精确控制等离子体射流和提高特定应用的材料处理效率的重要性。
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Influence of Operating Conditions on Electron Density in Atmospheric Pressure Helium Plasma Jets
Abstract In recent years, atmospheric-pressure plasma jets (APPJs) have emerged as valuable tools in many application areas, including material modification, environmental remediation and biomedicine. Understanding the discharge characteristics of these plasma jets under various operating conditions is crucial for optimizing process outcomes. This paper presents a two-dimensional fluid model for numerical simulation to study the variation in electron density within an atmospheric-pressure helium plasma jet under different operating conditions. The investigated parameters include helium gas flow rate, voltage amplitude, needle-to-ring discharge gap, and relative permittivity of the dielectric tube. The results reveal that the peak electric field and electron density initially occur at the wall of the dielectric tube and subsequently shift towards the head of the propagating jet. Gas flow rate has minimal impact on the electron density throughout the plasma jet, whereas increasing the needle-to-ring discharge gap significantly decreases the average electron density within the jet. In addition, an increase in the voltage amplitude and the relative permittivity of the dielectric tube enhances the electric field within the discharge space, thereby increasing the electron density in the plasma jet. These findings underscore the importance of understanding the correlation between electron density and operating conditions to precisely control plasma jets and enhance material treatment effectiveness for specific applications.
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