等离子体诱导的热电子注入效应:引入Ag NWs和MXene增强ZnO MSM杂化光电探测器性能的机理

Lingling Chu, Chao Xu, Duanwangde Liu, Chao Nie, Liting Deng
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摘要

本文研制了一种性能增强的金属-半导体-金属(MSM)混合紫外探测器(UVPD)。该装置包含一个由MXene纳米片组成的混合光敏层,该层覆盖在由包裹ZnO纳米粒子(NPs)的银纳米线(NWs)形成的薄膜上。这种结构,称为ZnO@Ag NWs/Mxene,利用了发生在Ag NWs和Mxene中的局域表面等离子体共振(LSPR)现象产生的热电子。这些热电子具有足够的能量穿过界面耗尽层并到达ZnO层。因此,注入的热电子作为ZnO层中附加的光载流子,从而增加了光生载流子的数量,提高了ZnO中的载流子浓度。改进后的UVPD器件在光强为6.52 mW/cm2,波长为365 nm的条件下,在5 V下的光电流可放大至~ 2499.35 nA。同时,实现了更高的性能指标,包括通断比~ 984.19,响应率(Rp) ~ 66.87 mA/W,探测率(D*) ~ 1.82 × 1011 jones。与仅基于ZnO结构的器件相比,这些值代表了显着的改进,分别提高了~ 24.90,3.93,23.38和9.33倍。根据得到的结果可以推断,利用热电子注入效应来设计和提高基于宽带隙半导体的光电器件的性能是一种合理有效的策略。
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Plasmon-induced Hot-electron Injection Effect: Mechanism of Performance Enhancement for ZnO MSM Hybrid Photodetector by Introducing Ag NWs and MXene
Abstract In this paper, a performance-enhanced hybrid ultraviolet metal-semiconductor-metal (MSM) photodetector (UVPD) has been produced. This device incorporates a mixed photosensitive layer consisting of MXene nanoflakes that are covered on a thin film formed by Ag nanowires (NWs) wrapped in ZnO nanoparticles (NPs). This configuration, referred to as ZnO@Ag NWs/Mxene, capitalizes on the hot electrons generated by the Localized Surface Plasmon Resonance (LSPR) phenomenon occurring in the Ag NWs and MXene. These hot electrons possess sufficient energy to traverse the interface depletion layer and reach the ZnO layer. Therefore, the injected hot electrons serve as additional photo carriers in the ZnO layer, thereby increasing the number of photo-generated carriers and improving the carrier concentration in ZnO. The improved UVPD device exhibits an amplified photocurrent of ~ 2499.35 nA at 5 V, under a light intensity of 6.52 mW/cm2 and a wavelength of 365 nm. Simultaneously, it achieves enhanced performance indices, including an On/Off Ratio of ~ 984.19, a responsivity (Rp) of ~ 66.87 mA/W, and a detectivity (D*) of ~ 1.82 × 1011 jones. These values represent a significant improvement compared to devices based solely on the ZnO configuration, with enhancements of ~ 24.90, 3.93, 23.38, and 9.33 times, respectively. Based on the obtained results, it can be inferred that employing the hot electron injection effect to design and enhance the performance of optoelectronic devices based on wide band gap semiconductors is a reasonable and effective strategy.
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