A. I. Okhapkin, M. N. Drozdov, P. A. Yunin, S. A. Kraev, D. B. Radishev
{"title":"不同氢含量和 sp3 杂化碳含量的氢化 DLC 薄膜的等离子化学沉积","authors":"A. I. Okhapkin, M. N. Drozdov, P. A. Yunin, S. A. Kraev, D. B. Radishev","doi":"10.1134/s1063782624010123","DOIUrl":null,"url":null,"abstract":"<h3 data-test=\"abstract-sub-heading\">Abstract</h3><p>The influence of methane plasma parameters on the deposition rate and on the content of the hydrogen and the <i>sp</i><sup>3</sup>-carbon fraction in hydrogenated diamond-like carbon films (DLC) was investigated. It was shown that the proportion of the <i>sp</i><sup>3</sup>-carbon fraction mainly depends on the inductive power and the argon addition to the plasma; the latter also contributes to a decrease of hydrogen in the films.</p>","PeriodicalId":21760,"journal":{"name":"Semiconductors","volume":"7 1","pages":""},"PeriodicalIF":0.6000,"publicationDate":"2024-08-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Plasma Chemical Deposition of Hydrogenated DLC Films with Different Hydrogen and sp3-Hybrid Carbon Content\",\"authors\":\"A. I. Okhapkin, M. N. Drozdov, P. A. Yunin, S. A. Kraev, D. B. Radishev\",\"doi\":\"10.1134/s1063782624010123\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<h3 data-test=\\\"abstract-sub-heading\\\">Abstract</h3><p>The influence of methane plasma parameters on the deposition rate and on the content of the hydrogen and the <i>sp</i><sup>3</sup>-carbon fraction in hydrogenated diamond-like carbon films (DLC) was investigated. It was shown that the proportion of the <i>sp</i><sup>3</sup>-carbon fraction mainly depends on the inductive power and the argon addition to the plasma; the latter also contributes to a decrease of hydrogen in the films.</p>\",\"PeriodicalId\":21760,\"journal\":{\"name\":\"Semiconductors\",\"volume\":\"7 1\",\"pages\":\"\"},\"PeriodicalIF\":0.6000,\"publicationDate\":\"2024-08-30\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Semiconductors\",\"FirstCategoryId\":\"101\",\"ListUrlMain\":\"https://doi.org/10.1134/s1063782624010123\",\"RegionNum\":4,\"RegionCategory\":\"物理与天体物理\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q4\",\"JCRName\":\"PHYSICS, CONDENSED MATTER\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Semiconductors","FirstCategoryId":"101","ListUrlMain":"https://doi.org/10.1134/s1063782624010123","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"PHYSICS, CONDENSED MATTER","Score":null,"Total":0}
Plasma Chemical Deposition of Hydrogenated DLC Films with Different Hydrogen and sp3-Hybrid Carbon Content
Abstract
The influence of methane plasma parameters on the deposition rate and on the content of the hydrogen and the sp3-carbon fraction in hydrogenated diamond-like carbon films (DLC) was investigated. It was shown that the proportion of the sp3-carbon fraction mainly depends on the inductive power and the argon addition to the plasma; the latter also contributes to a decrease of hydrogen in the films.
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Publishes the most important work in semiconductor research in the countries of the former Soviet Union. Covers semiconductor theory, transport phenomena in semiconductors, optics, magnetooptics, and electrooptics of semiconductors, semiconductor lasers and semiconductor surface physics. The journal features an extensive book review section.
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