{"title":"工业应用中 CMOS 灰度相机的图像拼接方法","authors":"Qi Liu , Ju Huo , Xiyu Tang , Muyao Xue","doi":"10.1016/j.optlastec.2024.111874","DOIUrl":null,"url":null,"abstract":"<div><div>To address the limited field of view (FOV) of CMOS grayscale cameras, complex lighting conditions, and the scarcity of image features in industrial applications, a novel image stitching method is proposed for CMOS grayscale cameras operating under varying lighting conditions. This method broadens the camera’s FOV while preserving the interpretability of image features, thereby enhancing the robustness and generalizability of image stitching across diverse lighting environments and feature-sparse settings. In the feature extraction phase, a hybrid deep feature extraction network is designed. By employing a deep learning-based approach, the network ensures the extraction of a substantial quantity of features. Building on this foundation, a method for line feature selection and reconstruction is developed to refine feature-matching accuracy, which increases the number of matching lines in extreme lighting and feature-scarce situations, and enriches the image features for subsequent stitching processes. In the subsequent image transformation phase, planar feature constraints are introduced; matching feature points and lines are used to generate planar features, addressing alterations in the collective shape of planes that are common in industrial image stitching. The paper concludes by presenting quantitative evaluation metrics for planar feature-based stitching. Experimental results validate the effectiveness and feasibility of the proposed method for image stitching of CMOS grayscale cameras under varied lighting conditions and in feature-deficient industrial settings, offering a viable solution to the challenges posed by the limited imaging FOV in industrial applications.</div></div>","PeriodicalId":19511,"journal":{"name":"Optics and Laser Technology","volume":"181 ","pages":"Article 111874"},"PeriodicalIF":4.6000,"publicationDate":"2024-10-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Image stitching method for CMOS grayscale cameras in industrial applications\",\"authors\":\"Qi Liu , Ju Huo , Xiyu Tang , Muyao Xue\",\"doi\":\"10.1016/j.optlastec.2024.111874\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><div>To address the limited field of view (FOV) of CMOS grayscale cameras, complex lighting conditions, and the scarcity of image features in industrial applications, a novel image stitching method is proposed for CMOS grayscale cameras operating under varying lighting conditions. This method broadens the camera’s FOV while preserving the interpretability of image features, thereby enhancing the robustness and generalizability of image stitching across diverse lighting environments and feature-sparse settings. In the feature extraction phase, a hybrid deep feature extraction network is designed. By employing a deep learning-based approach, the network ensures the extraction of a substantial quantity of features. Building on this foundation, a method for line feature selection and reconstruction is developed to refine feature-matching accuracy, which increases the number of matching lines in extreme lighting and feature-scarce situations, and enriches the image features for subsequent stitching processes. In the subsequent image transformation phase, planar feature constraints are introduced; matching feature points and lines are used to generate planar features, addressing alterations in the collective shape of planes that are common in industrial image stitching. The paper concludes by presenting quantitative evaluation metrics for planar feature-based stitching. Experimental results validate the effectiveness and feasibility of the proposed method for image stitching of CMOS grayscale cameras under varied lighting conditions and in feature-deficient industrial settings, offering a viable solution to the challenges posed by the limited imaging FOV in industrial applications.</div></div>\",\"PeriodicalId\":19511,\"journal\":{\"name\":\"Optics and Laser Technology\",\"volume\":\"181 \",\"pages\":\"Article 111874\"},\"PeriodicalIF\":4.6000,\"publicationDate\":\"2024-10-11\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Optics and Laser Technology\",\"FirstCategoryId\":\"101\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S003039922401332X\",\"RegionNum\":2,\"RegionCategory\":\"物理与天体物理\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q1\",\"JCRName\":\"OPTICS\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Optics and Laser Technology","FirstCategoryId":"101","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S003039922401332X","RegionNum":2,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"OPTICS","Score":null,"Total":0}
Image stitching method for CMOS grayscale cameras in industrial applications
To address the limited field of view (FOV) of CMOS grayscale cameras, complex lighting conditions, and the scarcity of image features in industrial applications, a novel image stitching method is proposed for CMOS grayscale cameras operating under varying lighting conditions. This method broadens the camera’s FOV while preserving the interpretability of image features, thereby enhancing the robustness and generalizability of image stitching across diverse lighting environments and feature-sparse settings. In the feature extraction phase, a hybrid deep feature extraction network is designed. By employing a deep learning-based approach, the network ensures the extraction of a substantial quantity of features. Building on this foundation, a method for line feature selection and reconstruction is developed to refine feature-matching accuracy, which increases the number of matching lines in extreme lighting and feature-scarce situations, and enriches the image features for subsequent stitching processes. In the subsequent image transformation phase, planar feature constraints are introduced; matching feature points and lines are used to generate planar features, addressing alterations in the collective shape of planes that are common in industrial image stitching. The paper concludes by presenting quantitative evaluation metrics for planar feature-based stitching. Experimental results validate the effectiveness and feasibility of the proposed method for image stitching of CMOS grayscale cameras under varied lighting conditions and in feature-deficient industrial settings, offering a viable solution to the challenges posed by the limited imaging FOV in industrial applications.
期刊介绍:
Optics & Laser Technology aims to provide a vehicle for the publication of a broad range of high quality research and review papers in those fields of scientific and engineering research appertaining to the development and application of the technology of optics and lasers. Papers describing original work in these areas are submitted to rigorous refereeing prior to acceptance for publication.
The scope of Optics & Laser Technology encompasses, but is not restricted to, the following areas:
•development in all types of lasers
•developments in optoelectronic devices and photonics
•developments in new photonics and optical concepts
•developments in conventional optics, optical instruments and components
•techniques of optical metrology, including interferometry and optical fibre sensors
•LIDAR and other non-contact optical measurement techniques, including optical methods in heat and fluid flow
•applications of lasers to materials processing, optical NDT display (including holography) and optical communication
•research and development in the field of laser safety including studies of hazards resulting from the applications of lasers (laser safety, hazards of laser fume)
•developments in optical computing and optical information processing
•developments in new optical materials
•developments in new optical characterization methods and techniques
•developments in quantum optics
•developments in light assisted micro and nanofabrication methods and techniques
•developments in nanophotonics and biophotonics
•developments in imaging processing and systems