镍 (II) 半咔唑酮驱动的镍纳米粒子的合成和电磁干扰屏蔽研究

IF 4.3 3区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Materials Chemistry and Physics Pub Date : 2024-10-19 DOI:10.1016/j.matchemphys.2024.130064
Mruganchali A. Joshi, Pawan K. Khanna, Naeem Mohammad, Prasad Ganesh Joshi
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引用次数: 0

摘要

在此,我们报告了利用环状半咔唑酮衍生物的 Ni (II) 复合物合成镍纳米颗粒(Ni-NPs)及其电磁干扰(EMI)屏蔽行为。研究人员合成了环状半咔唑酮的 Ni (II) 复合物,并利用各种光谱工具对其进行了表征。研究发现,当这种配合物被水合肼还原时,是合成镍-氮磷的极佳前体。预计半咔唑酮配体的存在将使反应动力学正常化,而且在纳米颗粒形成过程中,半咔唑酮配体的解离和部分消耗将为颗粒周围的温和功能性提供额外的优势。通过 XRD、TEM、SEM 和 AFM 对从环状半咔唑酮中获得的各种镍络合物进行了测试,将其作为合成 Ni-NPs 的有效前体,并通过 VSM 对其磁性行为进行了研究。柔性镍/PVA 复合薄膜的电磁干扰屏蔽效率显示,在 PVA 基体中的负载量约为 25% 时,X 波段(8-12 GHz)的屏蔽效率约为负(-)30 dB。
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Synthesis and EMI shielding study of Ni (II) semicarbazone driven nickel nanoparticles
Herein, we report the synthesis of nickel nanoparticles (Ni-NPs) from Ni (II) complexes of cyclic semicarbazone derivatives and their electromagnetic interference (EMI) shielding behaviour. Ni (II) complexes of cyclic semicarbazones were synthesized and characterized by various spectroscopic tools. It was observed that such complexes are excellent precursors for the synthesis of Ni-NPs when reduced by hydrazine hydrate. It is expected that the reaction kinetics will be ably normalized by the presence of semicarbazone ligand and that upon dissociation and partial consumption during nano-particle formation, will provide an added advantage of mild functionality around the particles. Overall various nickel complexes obtained from cyclic semicarbazones were tested as an effective precursor for the synthesis of Ni-NPs which were characterized by XRD, TEM, SEM, and AFM, and their magnetic behaviour was studied by VSM. EMI shielding efficiency of flexible Ni/PVA composite films showed shielding efficiency of about minus (−) 30 dB in X-band (8–12 GHz) for about 25 % loading in the PVA matrix.
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来源期刊
Materials Chemistry and Physics
Materials Chemistry and Physics 工程技术-材料科学:综合
CiteScore
8.70
自引率
4.30%
发文量
1515
审稿时长
69 days
期刊介绍: Materials Chemistry and Physics is devoted to short communications, full-length research papers and feature articles on interrelationships among structure, properties, processing and performance of materials. The Editors welcome manuscripts on thin films, surface and interface science, materials degradation and reliability, metallurgy, semiconductors and optoelectronic materials, fine ceramics, magnetics, superconductors, specialty polymers, nano-materials and composite materials.
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