构建用于降解有机污染物的 WO3-可见光-H2O2 高级氧化系统

IF 2.8 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Journal of Materials Science: Materials in Electronics Pub Date : 2024-11-13 DOI:10.1007/s10854-024-13827-3
Yasi Li
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引用次数: 0

摘要

有机污染物对水资源的污染日益严重,因此有必要开发高效、环保的处理技术。本研究构建了一种 WO3-可见光-H2O2(WO3-Vis-H2O2)高级氧化系统,并选择难降解的偶氮染料甲基橙(MO)作为有机污染物的目标。在系统的最佳条件下,可见光照射 100 分钟可降解 97.9% 的甲基橙。降解过程符合一阶动力学方程,表观速率常数 k 为 0.03909 min-1。该体系对 MO 的降解效率是 WO3 光催化降解 MO 的 5.54 倍。自由基捕获实验证明,-OH 是主要的活性物种。该系统实现了无铁异相光-芬顿反应的效果,且 WO3 可重复使用。这项工作不仅提出了一种绿色、可持续的有机污染物降解方法,而且凸显了可见光催化剂-可见光-H2O2 系统在更广泛的环境修复应用中的潜力。
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Construction of WO3–visible light–H2O2 advanced oxidation system for degradation of organic pollutant

The escalating pollution of water resources by organic pollutants necessitates the development of efficient and eco-friendly treatment technologies. In this study, a WO3–visible light–H2O2 (WO3–Vis–H2O2) advanced oxidation system was constructed, and the difficult-to-degrade azo dye methyl orange (MO) was selected as the target of organic pollutants. Under the optimal conditions of the system, 97.9% of MO can be degraded under 100 min of visible light irradiation. The degradation process confirmed to the first-order kinetic equation, and the apparent rate constant k is 0.03909 min−1. The degradation efficiency of MO by this system was 5.54 times higher than that of WO3 photocatalytic degradation of MO. Free radical capture experiments proved that ·OH was the main active species. The system realized the effect of the iron-free heterogeneous photo-Fenton reaction, and WO3 can be reused. This work not only presents a green and sustainable approach to the degradation of organic pollutants but also highlights the potential of visible light catalyst–visible–H2O2 system for broader environmental remediation applications.

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来源期刊
Journal of Materials Science: Materials in Electronics
Journal of Materials Science: Materials in Electronics 工程技术-材料科学:综合
CiteScore
5.00
自引率
7.10%
发文量
1931
审稿时长
2 months
期刊介绍: The Journal of Materials Science: Materials in Electronics is an established refereed companion to the Journal of Materials Science. It publishes papers on materials and their applications in modern electronics, covering the ground between fundamental science, such as semiconductor physics, and work concerned specifically with applications. It explores the growth and preparation of new materials, as well as their processing, fabrication, bonding and encapsulation, together with the reliability, failure analysis, quality assurance and characterization related to the whole range of applications in electronics. The Journal presents papers in newly developing fields such as low dimensional structures and devices, optoelectronics including III-V compounds, glasses and linear/non-linear crystal materials and lasers, high Tc superconductors, conducting polymers, thick film materials and new contact technologies, as well as the established electronics device and circuit materials.
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