Tailoring of dielectric behavior and a.c. conduction in binary Se80Te20 glass by incorporation of transition metals (Fe, Co, Ni, Cu)

IF 2.8 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Journal of Materials Science: Materials in Electronics Pub Date : 2024-11-22 DOI:10.1007/s10854-024-13801-z
Nisha Kumari, Vishnu Saraswat, A. Dahshan, Neeraj Mehta
{"title":"Tailoring of dielectric behavior and a.c. conduction in binary Se80Te20 glass by incorporation of transition metals (Fe, Co, Ni, Cu)","authors":"Nisha Kumari,&nbsp;Vishnu Saraswat,&nbsp;A. Dahshan,&nbsp;Neeraj Mehta","doi":"10.1007/s10854-024-13801-z","DOIUrl":null,"url":null,"abstract":"<div><p>Transition metals (TMs) iron, cobalt, copper, and nickel have been chosen as the chemical modifiers with a binary alloy Se<sub>80</sub>Te<sub>20</sub> as the parent sample to make novel Se<sub>78</sub>Te<sub>20</sub>TM<sub>2</sub> (TM = Fe, Co, Ni, Cu) alloys. The frequency dependence of dielectric loss and a.c. conductivity (<span>\\({\\sigma }_{ac})\\)</span> have been studied and the possible mechanism has been checked. The dielectric constant (<i>ε</i>') shows significant variation among the samples, with the parent Se<sub>80</sub>Te<sub>20</sub> alloy exhibiting the highest value, followed closely by Se<sub>78</sub>Te<sub>20</sub>Cu<sub>2</sub>. Conversely, Se<sub>78</sub>Te<sub>20</sub>Fe<sub>2</sub> and Se<sub>78</sub>Te<sub>20</sub>Ni<sub>2</sub> alloys exhibit much lower values. The dielectric loss also varies widely, with Se<sub>80</sub>Te<sub>20</sub>, while Se<sub>78</sub>Te<sub>20</sub>Fe<sub>2</sub> and Se<sub>78</sub>Te<sub>20</sub>Ni<sub>2</sub> alloys present extremely low values of loss. The barrier height ranges between 0.31 eV (Fe-doped sample) and 1.2 eV (Ni-doped sample), indicating that doping influences the band gap significantly. The hooping distance shows considerable differences, with Fe-doped alloys exhibiting the highest value at 39.5 Å, while Co-doped samples show the lowest at 11.4 Å. Applicability of the Meyer-Neldel rule is observed in the a.c. conduction for all samples. The reducing nature of the power-law exponent “<i>s</i>” with increasing temperature indicates the correlated barrier hopping model for Se<sub>80</sub>Te<sub>20</sub> and Se<sub>78</sub>Te<sub>20</sub>TM<sub>2</sub> (TM = Co, Ni, Cu) alloys, as they exhibit a certain nature of variation. However, because “<i>s</i>” increases with temperature, the non-overlapping small polaron tunneling model is a particularly appropriate mechanism for a.c. conduction of ternary Se<sub>78</sub>Te<sub>20</sub>Fe<sub>2</sub> alloy. Furthermore, we estimated the density of localized states for the synthesized material at various temperatures. The maximum reduction in the density of states is observed for the iron-containing parent sample.</p></div>","PeriodicalId":646,"journal":{"name":"Journal of Materials Science: Materials in Electronics","volume":"35 33","pages":""},"PeriodicalIF":2.8000,"publicationDate":"2024-11-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Materials Science: Materials in Electronics","FirstCategoryId":"5","ListUrlMain":"https://link.springer.com/article/10.1007/s10854-024-13801-z","RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0

Abstract

Transition metals (TMs) iron, cobalt, copper, and nickel have been chosen as the chemical modifiers with a binary alloy Se80Te20 as the parent sample to make novel Se78Te20TM2 (TM = Fe, Co, Ni, Cu) alloys. The frequency dependence of dielectric loss and a.c. conductivity (\({\sigma }_{ac})\) have been studied and the possible mechanism has been checked. The dielectric constant (ε') shows significant variation among the samples, with the parent Se80Te20 alloy exhibiting the highest value, followed closely by Se78Te20Cu2. Conversely, Se78Te20Fe2 and Se78Te20Ni2 alloys exhibit much lower values. The dielectric loss also varies widely, with Se80Te20, while Se78Te20Fe2 and Se78Te20Ni2 alloys present extremely low values of loss. The barrier height ranges between 0.31 eV (Fe-doped sample) and 1.2 eV (Ni-doped sample), indicating that doping influences the band gap significantly. The hooping distance shows considerable differences, with Fe-doped alloys exhibiting the highest value at 39.5 Å, while Co-doped samples show the lowest at 11.4 Å. Applicability of the Meyer-Neldel rule is observed in the a.c. conduction for all samples. The reducing nature of the power-law exponent “s” with increasing temperature indicates the correlated barrier hopping model for Se80Te20 and Se78Te20TM2 (TM = Co, Ni, Cu) alloys, as they exhibit a certain nature of variation. However, because “s” increases with temperature, the non-overlapping small polaron tunneling model is a particularly appropriate mechanism for a.c. conduction of ternary Se78Te20Fe2 alloy. Furthermore, we estimated the density of localized states for the synthesized material at various temperatures. The maximum reduction in the density of states is observed for the iron-containing parent sample.

Abstract Image

查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
通过加入过渡金属(铁、钴、镍、铜)调整二元 Se80Te20 玻璃的介电行为和直流导纳
以二元合金 Se80Te20 为母样,选择过渡金属(TMs)铁、钴、铜和镍作为化学改性剂,制备出新型 Se78Te20TM2(TM = 铁、钴、镍、铜)合金。研究了介电损耗和直流电导(\({\sigma }_{ac})\)的频率依赖性,并检验了可能的机理。介电常数(ε')在不同样品之间存在显著差异,母体 Se80Te20 合金的介电常数最高,紧随其后的是 Se78Te20Cu2。相反,Se78Te20Fe2 和 Se78Te20Ni2 合金的数值要低得多。介电损耗的差异也很大,Se80Te20、Se78Te20Fe2 和 Se78Te20Ni2 合金的损耗值极低。势垒高度介于 0.31 eV(掺杂铁的样品)和 1.2 eV(掺杂镍的样品)之间,表明掺杂对带隙的影响很大。所有样品的a.c.传导都适用梅耶-奈德尔法则。幂律指数 "s "随温度升高而减小的特性表明 Se80Te20 和 Se78Te20TM2(TM = Co、Ni、Cu)合金采用了相关势垒跳变模型,因为它们表现出一定的变化特性。然而,由于 "s "随温度升高而增大,非重叠小极子隧道模型特别适合于三元 Se78Te20Fe2 合金的交流传导机制。此外,我们还估算了合成材料在不同温度下的局域态密度。我们观察到含铁母体样品的态密度降低幅度最大。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
Journal of Materials Science: Materials in Electronics
Journal of Materials Science: Materials in Electronics 工程技术-材料科学:综合
CiteScore
5.00
自引率
7.10%
发文量
1931
审稿时长
2 months
期刊介绍: The Journal of Materials Science: Materials in Electronics is an established refereed companion to the Journal of Materials Science. It publishes papers on materials and their applications in modern electronics, covering the ground between fundamental science, such as semiconductor physics, and work concerned specifically with applications. It explores the growth and preparation of new materials, as well as their processing, fabrication, bonding and encapsulation, together with the reliability, failure analysis, quality assurance and characterization related to the whole range of applications in electronics. The Journal presents papers in newly developing fields such as low dimensional structures and devices, optoelectronics including III-V compounds, glasses and linear/non-linear crystal materials and lasers, high Tc superconductors, conducting polymers, thick film materials and new contact technologies, as well as the established electronics device and circuit materials.
期刊最新文献
Enhancing the heterointerface stability of Al2O3/Ba0.5Sr0.5TiO3/Al2O3 composite thin films by adaptive anodizing method under high electric field Electrochemical properties of CuxCo1-xFe2O4 nanoparticles via cationic substitution for supercapacitor applications Degradation of Congo Red using polymer-stabilized metal nanocatalyst Structural, thermal, and optical properties of gold nanoparticle-doped bismuth borate glasses: effect of concentration Optical and scintillation properties of Tm-doped Ca3TaGa3Si2O14 single crystals
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1