用于神经启发计算的基于稳定锡锌氧化物的晶闸管中的非线性和线性电导调制与突触可塑性

IF 4.2 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Materials Science in Semiconductor Processing Pub Date : 2024-11-15 DOI:10.1016/j.mssp.2024.109111
Rajwali Khan , Shahid Iqbal , Fazal Raziq , Pardha Saradhi Maram , Sabyasachi Chakrabortty , Sambasivam Sangaraju
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引用次数: 0

摘要

在氧化物半导体系统中诱导跃迁后金属极有可能用于神经形态计算的存储。要找到一种能在多种电阻状态之间稳定切换的材料具有挑战性。本研究探讨了掺杂锡(过渡后金属)的氧化锌(SZO)薄膜的忆阻特性,重点是其在忆阻器设备中的应用。以Ag/SZO/Au/Ti/SiO₂器件形式合成的(磁控溅射)SZO薄膜表现出明显的双极电阻开关(BRS)行为,其VSET和VRESET分别为1.0 V和-0.75 V。忆阻器可以在高阻态和低阻态之间以 104 的高 RON/OFF 率变化,模拟突触行为(如电位和抑制)。这种切换归因于 SZO 层内银丝的形成和溶解,受到银离子迁移和氧空位存在的影响。这些空位有助于在正偏压下形成导电丝,并在负偏压下溶解。耐久性和保持力测试显示了稳定的开关特性,忆阻器在 100 个周期内保持了不同的 HRS 和 LRS 状态,并在 5K 秒以上的时间内保持这些状态,没有出现明显的衰减。最后,电位增强和抑制的非线性值分别为αp∼1.6和αd∼-0.14,表明忆阻器可能对生物系统中突触权重的增加反应更灵敏。极小脉宽下的线性响应表明,该器件更适用于神经形态应用。观察到的忆阻器具有稳定的耐久性和保持性能,这表明这种忆阻器结构可能在人工突触和记忆技术的发展中发挥关键作用。
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Nonlinear and linear conductance modulation and synaptic plasticity in stable tin-zinc oxide based-memristor for neuro-inspired computing
Inducing post-transition metals in an oxide semiconductor system has a high potential for use in storage for neuromorphic computing. It is challenging to find a material that can be switched stably between multiple resistance states. This research explores the memristive properties of Sn (post-transition metal)-doped ZnO (SZO) thin films, emphasizing their application in memristor devices. The (magnetron sputtered) synthesized SZO thin films in the form of Ag/SZO/Au/Ti/SiO₂ device demonstrated a clear bipolar resistive switching (BRS) behavior with VSET and VRESET of 1.0 V and −0.75 V, respectively. The memristor could change between a high resistance state and a low resistance state with a high RON/OFF rate of 104, mimicking synaptic behaviors such as potentiation and depression. This switching is attributed to the formation and dissolution of Ag filaments within the SZO layer, influenced by the migration of Ag⁺ ions and the presence of oxygen vacancies. These vacancies facilitate the formation of conductive filaments under positive bias and their dissolution under negative bias. The endurance and retention tests showed stable switching characteristics, with the memristor maintaining distinct HRS and LRS over 100 cycles and retaining these states for over 5K seconds without significant degradation. Finally, the nonlinearity values for potentiation and depression were αp∼1.6 and αd ∼ -0.14, suggesting that the memristor may be more responsive to increasing synaptic weights in biological systems. The linearity response at a very small pulse width showed the device is more applicable for neuromorphic applications. The observed memristor combined with stable endurance and retention performance, suggests that this memristor structure could play a crucial role in the development of artificial synapses and memory technologies.
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来源期刊
Materials Science in Semiconductor Processing
Materials Science in Semiconductor Processing 工程技术-材料科学:综合
CiteScore
8.00
自引率
4.90%
发文量
780
审稿时长
42 days
期刊介绍: Materials Science in Semiconductor Processing provides a unique forum for the discussion of novel processing, applications and theoretical studies of functional materials and devices for (opto)electronics, sensors, detectors, biotechnology and green energy. Each issue will aim to provide a snapshot of current insights, new achievements, breakthroughs and future trends in such diverse fields as microelectronics, energy conversion and storage, communications, biotechnology, (photo)catalysis, nano- and thin-film technology, hybrid and composite materials, chemical processing, vapor-phase deposition, device fabrication, and modelling, which are the backbone of advanced semiconductor processing and applications. Coverage will include: advanced lithography for submicron devices; etching and related topics; ion implantation; damage evolution and related issues; plasma and thermal CVD; rapid thermal processing; advanced metallization and interconnect schemes; thin dielectric layers, oxidation; sol-gel processing; chemical bath and (electro)chemical deposition; compound semiconductor processing; new non-oxide materials and their applications; (macro)molecular and hybrid materials; molecular dynamics, ab-initio methods, Monte Carlo, etc.; new materials and processes for discrete and integrated circuits; magnetic materials and spintronics; heterostructures and quantum devices; engineering of the electrical and optical properties of semiconductors; crystal growth mechanisms; reliability, defect density, intrinsic impurities and defects.
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