基于 FE 的渐变沟道无结 FET 线性分析,为低功耗应用获取负电容

IF 2.7 Q2 PHYSICS, CONDENSED MATTER Micro and Nanostructures Pub Date : 2024-11-08 DOI:10.1016/j.micrna.2024.208013
Ankush Chattopadhyay
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引用次数: 0

摘要

本文介绍了基于铁电(FE)氧化物的分级沟道无结场效应晶体管,其特点是在纳米尺度下具有负电容效应。根据三阶截获点(PIP3)、二阶和三阶谐波截获电压(VIP2、VIP3)以及互调失真(IMD3)分析了其响应的线性性质。我们观察并详细分析了栅极和下隙长度、铁电氧化物厚度、分级沟道掺杂和工作温度等基本器件参数对其线性行为的影响。此外,还发现阈下斜率在 60mV/dec 以下为最佳特性,从而获得了数控特性。在其电路应用部分,使用所提出的器件设计了一个级联放大器,显示了因所提出的器件尺寸变化而产生的变化。该器件是利用 Silvaco ATLAS 器件模拟器设计和模拟的,并根据现有的实验结果进行了校准。因此,本研究与近期的低功耗模拟应用相当相关。
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Linearity analysis of FE-based graded channel junctionless FET obtaining negative capacitance for low power applications
This paper reports ferroelectric (FE) oxide based graded-channel junctionless FET featuring the negative capacitance effects in nano-scale regime. The linearity nature of its response is analyzed on the basis of third order interception point (PIP3), harmonic interception voltages of 2nd and 3rd orders (VIP2, VIP3) and intermodulation distortion (IMD3). Influence of fundamental device’s parameters such as, gate and underlap length, ferroelectric oxide thickness, graded channel doping and operating temperature on its linear behavior is observed and analyzed in detail. The subthreshold slope is also found to go below 60mV/dec for optimum features, obtaining the NC characteristics. In its circuit application part, a cascode amplifier is designed using the proposed device showing variations due to the change in the proposed device dimensions. The proposed device is designed and simulated using Silvaco ATLAS device simulator, which is calibrated with the available experimental results. Therefore, the present study is quite relevant in recent days for low power analog applications.
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