{"title":"一种描述掺f氧化锌薄膜电导率与带隙关系的方法","authors":"M. Othmane, A. Attaf, F. Bouaichi, H. Saidi","doi":"10.1007/s10854-024-14203-x","DOIUrl":null,"url":null,"abstract":"<div><p>The ultrasonic spray method was applied to investigate fluorine-doped zinc oxide thin films on glass substrate at 420 °C, with different fluorine doping rates ranging from 0 to 5 at%. This study presents a new description of the relationship linking the electrical conductivity to the optical band gap with various fluorine doping levels. It was found that all films exhibited high electrical conductivity values. The highest electrical conductivity was found equal to 169 (Ωcm)<sup>−1</sup>; this was obtained for the 5 at% doping level. Moreover, it turned out that the optical band gap dropped from 3.39 to 3.28 eV as the fluorine doping level augmented. The correlation between the electrical and optical properties and the doping level suggests that the optical band gap and fluorine doping level have a significant impact on the electrical conductivity of the thin films under consideration. In addition, the equation correlating the electrical conductivity and the doping level gave a maximum error of about 4% for fluorine-doped zinc oxide for a concentration of 3 at%. However, the experimental results for the correlation between the electrical conductivity and the fluorine doping level of ZnO films turned out to be invariable.</p></div>","PeriodicalId":646,"journal":{"name":"Journal of Materials Science: Materials in Electronics","volume":"36 2","pages":""},"PeriodicalIF":2.8000,"publicationDate":"2025-01-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"An approach to the description of the correlation between the electrical conductivity and the band gap of F-doped zinc oxide thin films\",\"authors\":\"M. Othmane, A. Attaf, F. Bouaichi, H. Saidi\",\"doi\":\"10.1007/s10854-024-14203-x\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p>The ultrasonic spray method was applied to investigate fluorine-doped zinc oxide thin films on glass substrate at 420 °C, with different fluorine doping rates ranging from 0 to 5 at%. This study presents a new description of the relationship linking the electrical conductivity to the optical band gap with various fluorine doping levels. It was found that all films exhibited high electrical conductivity values. The highest electrical conductivity was found equal to 169 (Ωcm)<sup>−1</sup>; this was obtained for the 5 at% doping level. Moreover, it turned out that the optical band gap dropped from 3.39 to 3.28 eV as the fluorine doping level augmented. The correlation between the electrical and optical properties and the doping level suggests that the optical band gap and fluorine doping level have a significant impact on the electrical conductivity of the thin films under consideration. In addition, the equation correlating the electrical conductivity and the doping level gave a maximum error of about 4% for fluorine-doped zinc oxide for a concentration of 3 at%. However, the experimental results for the correlation between the electrical conductivity and the fluorine doping level of ZnO films turned out to be invariable.</p></div>\",\"PeriodicalId\":646,\"journal\":{\"name\":\"Journal of Materials Science: Materials in Electronics\",\"volume\":\"36 2\",\"pages\":\"\"},\"PeriodicalIF\":2.8000,\"publicationDate\":\"2025-01-09\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Materials Science: Materials in Electronics\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://link.springer.com/article/10.1007/s10854-024-14203-x\",\"RegionNum\":4,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Materials Science: Materials in Electronics","FirstCategoryId":"5","ListUrlMain":"https://link.springer.com/article/10.1007/s10854-024-14203-x","RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
An approach to the description of the correlation between the electrical conductivity and the band gap of F-doped zinc oxide thin films
The ultrasonic spray method was applied to investigate fluorine-doped zinc oxide thin films on glass substrate at 420 °C, with different fluorine doping rates ranging from 0 to 5 at%. This study presents a new description of the relationship linking the electrical conductivity to the optical band gap with various fluorine doping levels. It was found that all films exhibited high electrical conductivity values. The highest electrical conductivity was found equal to 169 (Ωcm)−1; this was obtained for the 5 at% doping level. Moreover, it turned out that the optical band gap dropped from 3.39 to 3.28 eV as the fluorine doping level augmented. The correlation between the electrical and optical properties and the doping level suggests that the optical band gap and fluorine doping level have a significant impact on the electrical conductivity of the thin films under consideration. In addition, the equation correlating the electrical conductivity and the doping level gave a maximum error of about 4% for fluorine-doped zinc oxide for a concentration of 3 at%. However, the experimental results for the correlation between the electrical conductivity and the fluorine doping level of ZnO films turned out to be invariable.
期刊介绍:
The Journal of Materials Science: Materials in Electronics is an established refereed companion to the Journal of Materials Science. It publishes papers on materials and their applications in modern electronics, covering the ground between fundamental science, such as semiconductor physics, and work concerned specifically with applications. It explores the growth and preparation of new materials, as well as their processing, fabrication, bonding and encapsulation, together with the reliability, failure analysis, quality assurance and characterization related to the whole range of applications in electronics. The Journal presents papers in newly developing fields such as low dimensional structures and devices, optoelectronics including III-V compounds, glasses and linear/non-linear crystal materials and lasers, high Tc superconductors, conducting polymers, thick film materials and new contact technologies, as well as the established electronics device and circuit materials.