结合热离子发射和隧道机制分析4H-SiC肖特基势垒二极管泄漏电流

IF 1.1 Q4 QUANTUM SCIENCE & TECHNOLOGY Semiconductor Physics Quantum Electronics & Optoelectronics Pub Date : 2019-03-30 DOI:10.15407/spqeo22.01.019
A. Latreche
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引用次数: 10

摘要

本文提出了一种分析4H-SiC肖特基势垒二极管反向特性的新方法。该模型同时考虑了载流子穿过肖特基势垒隧穿引起的电流和载流子穿过金属-半导体界面的热离子发射引起的电流。该处理包括像力对热离子发射和电子隧穿过程的影响。这种分析使我们能够分离和识别总电流的热离子发射和隧道组件。利用两种模型,从热离子发射与隧道过程的交点出发,确定了热离子发射与隧道过程的实验反向跃迁电压;垒高的偏倚依赖性和无偏倚依赖性。在高温下,根据Latreche模型预测,实验反过渡电压随温度升高而升高,随掺杂浓度升高而降低。
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Combination of thermionic emission and tunneling mechanisms to analyze the leakage current in 4H-SiC Schottky barrier diodes
A new method to analyze reverse characteristics of 4H-SiC Schottky barrier diode has been presented in this paper. The model incorporates both the current induced by the tunneling of carriers through the Schottky barrier and that induced by the thermionic emission of carriers across the metal–semiconductor interface. The treatment includes the effect of image force lowering both the thermionic emission and electron tunneling processes. This analysis allowed us to separate and identify the thermionic emission and tunneling components of the total current. The experimental reverse transition voltage between thermionic emission and tunneling process can be determined from the intersection of the two components by using two models; bias dependence and no bias dependence of barrier height. For high temperatures, the experimental reverse transition voltage increases with increasing the temperature and decreases with increasing the doping concentration as predicted by Latreche’s model.
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来源期刊
CiteScore
1.80
自引率
22.20%
发文量
43
审稿时长
15 weeks
期刊最新文献
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