Alexander Fritsch, Michael Kugel, Rolf Sautter, D. Wendel, J. Pille, O. Torreiter, S. Kalyanasundaram, Daniel Dobson
{"title":"采用14nm SOI FinFET技术的4GHz低延迟TCAM,采用高性能电流检测放大器来降低交流电流浪涌","authors":"Alexander Fritsch, Michael Kugel, Rolf Sautter, D. Wendel, J. Pille, O. Torreiter, S. Kalyanasundaram, Daniel Dobson","doi":"10.1109/ESSCIRC.2015.7313897","DOIUrl":null,"url":null,"abstract":"A 4GHz, low latency TCAM in 14nm SOI FinFET technology, using a matchline current sensing scheme with an energy consumption of 0.63 fJ/bit/search at 0.9V and a peak current reduction of 50% compared to voltage sensing implementations. A by entry adjustable search depth allows to reduce power consumption for variable size translation tables. The implemented sandwich floorplan enables an area efficient integration of high performance 0.286μm2 16T-TCAM and 0.143μm2 8T-SRAM cells.","PeriodicalId":11845,"journal":{"name":"ESSCIRC Conference 2015 - 41st European Solid-State Circuits Conference (ESSCIRC)","volume":"16 1","pages":"343-346"},"PeriodicalIF":0.0000,"publicationDate":"2015-11-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"6","resultStr":"{\"title\":\"A 4GHz, low latency TCAM in 14nm SOI FinFET technology using a high performance current sense amplifier for AC current surge reduction\",\"authors\":\"Alexander Fritsch, Michael Kugel, Rolf Sautter, D. Wendel, J. Pille, O. Torreiter, S. Kalyanasundaram, Daniel Dobson\",\"doi\":\"10.1109/ESSCIRC.2015.7313897\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A 4GHz, low latency TCAM in 14nm SOI FinFET technology, using a matchline current sensing scheme with an energy consumption of 0.63 fJ/bit/search at 0.9V and a peak current reduction of 50% compared to voltage sensing implementations. A by entry adjustable search depth allows to reduce power consumption for variable size translation tables. The implemented sandwich floorplan enables an area efficient integration of high performance 0.286μm2 16T-TCAM and 0.143μm2 8T-SRAM cells.\",\"PeriodicalId\":11845,\"journal\":{\"name\":\"ESSCIRC Conference 2015 - 41st European Solid-State Circuits Conference (ESSCIRC)\",\"volume\":\"16 1\",\"pages\":\"343-346\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2015-11-02\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"6\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"ESSCIRC Conference 2015 - 41st European Solid-State Circuits Conference (ESSCIRC)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ESSCIRC.2015.7313897\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"ESSCIRC Conference 2015 - 41st European Solid-State Circuits Conference (ESSCIRC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ESSCIRC.2015.7313897","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 6
摘要
14nm SOI FinFET技术的4GHz低延迟TCAM,采用匹配线电流传感方案,在0.9V时能耗为0.63 fJ/bit/搜索,与电压传感实现相比,峰值电流降低50%。按条目可调的搜索深度允许减少可变大小翻译表的功耗。所实现的三明治平面设计实现了高性能0.286μm2 16T-TCAM和0.143μm2 8T-SRAM单元的面积高效集成。
A 4GHz, low latency TCAM in 14nm SOI FinFET technology using a high performance current sense amplifier for AC current surge reduction
A 4GHz, low latency TCAM in 14nm SOI FinFET technology, using a matchline current sensing scheme with an energy consumption of 0.63 fJ/bit/search at 0.9V and a peak current reduction of 50% compared to voltage sensing implementations. A by entry adjustable search depth allows to reduce power consumption for variable size translation tables. The implemented sandwich floorplan enables an area efficient integration of high performance 0.286μm2 16T-TCAM and 0.143μm2 8T-SRAM cells.