基于16nm Fin-FET体CMOS技术的HCI和xBTI芯片上数字老化监视器

M. Igarashi, K. Takeuchi, T. Okagaki, K. Shibutani, Hiroaki Matsushita, K. Nii
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引用次数: 11

摘要

提出了一种基于环形振荡器(RO)的芯片老化监测方法,该方法可以测量偏置温度不稳定性(BTI)和交流热载流子感染(HCI)。监视器由对称RO (SRO)和非对称RO (ASRO)组成。NBTI和PBTI的影响可以通过关注在直流应力条件下SRO和ASRO观察到的灵敏度差异来区分。此外,由于ASRO中长/短过渡的不平衡延迟在交流应力下对AC- hci具有很高的敏感性,因此对AC- hci引起的速度退化进行了监测。一个测试芯片包括SRO和ASRO使用2NAND标准单元在16纳米Fin-FET体CMOS技术实现。我们观察到,由于频率退化而测量到的PBTI的Vth移位为2 mV,这仍然是Fin-FET技术中NBTI的1/10。测量的AC-HCI显示了几乎一半的老化因素。老化监视器在设计阶段优化设计保护带(GB),使高性能应用lsi系统可靠。
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An on-die digital aging monitor against HCI and xBTI in 16 nm Fin-FET bulk CMOS technology
We propose an on-die aging monitor based on ring-oscillator (RO) which measures bias-temperature-instabilities (BTI) and AC hot-carrier-infection (HCI). The monitor consists of a symmetric RO (SRO) and an asymmetric RO (ASRO). The effect of NBTI and PBTI can be separated by focusing on the difference in sensitivity observed in SRO and ASRO under DC stress condition. In addition, the speed degradation caused by AC-HCI is monitored because unbalanced delay with long/short transition in ASRO has high sensitivity against AC-HCI under AC stress. A test chip including both SRO and ASRO using 2NAND standard cells is implemented in a 16 nm Fin-FET bulk CMOS technology. We observe that Vth shift due to PBTI measured from frequency degradation is 2 mV, which is still 1/10 of NBTI in Fin-FET technology. The measured AC-HCI shows almost half percentage of all aging factors. The aging monitor optimizes the design guard band (GB) in design phase and enables dependable system in high performance application LSIs.
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