光探测器件中图案InN的光学特性

Lung-Hsing Hsu, Yuh-Jen Cheng, P. Yu, H. Kuo, C. Lin
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引用次数: 0

摘要

采用纳米压印和LPMOCVD外延技术,在图像化的GaN模板上进行了InN选择性面积生长。采用斜角电子束蒸发法制备ITO棒。x射线衍射图提供了图形化的InN晶体的六边形取向。利用光致发光(PL)技术研究了高费米能级致受体发射引起的宽带信号和峰值能量蓝移现象。拉曼位移特征表征了高质量模式的InN增长。InN纳米结构/ITO棒增强宽带和不依赖角度的抗反射。在1470 ~ 1580 nm的可调激光照射下,证明了该材料具有近红外响应,并通过AM1.5G太阳模拟光谱测量了部分光电流(920 nm长通)为33°。
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Optical Properties of Patterned InN in Photodetection Devices
InN selective-area-growth on patterned GaN templates was employed by nano-imprint lithography and LPMOCVD epitaxy. ITO rods were deposited by oblique-angle electron beam evaporation. The X-ray diffraction patterns provide the hexagonal orientation of patterned InN crystals. The broad band signal and peak energy blue-shift phenomenon due to higher Fermi-level to acceptor emission were investigated by photoluminescence (PL). The Raman-shifts characterized the high-quality patterned InN growth. InN nanostructures/ITO rods enhanced broadband and angle-independent anti-reflection. It was demonstrated with near-infrared response by a tunable laser illumination (1470 ˜1580 nm), and the portion photocurrent (920 nm long pass) exhibits 33° measured via AM1.5G solar simulated spectra.
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