用于细间距倒装芯片互连的金属涂层单尺寸聚合物芯颗粒

M. Sugden, Changqing Liu, D. Hutt, D. Whalley, H. Kristiansen
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引用次数: 7

摘要

随着对细间距倒装芯片互连需求的不断增长,人们对广泛使用的焊点的替代品产生了浓厚的兴趣。使用单尺寸金属涂层聚合物微球正在成为实现球栅阵列和芯片级封装更坚固可靠的互连的一种方法。本文介绍了一项合作研究项目的结果,该项目调查了聚合物芯互连是否是这种超细间距焊点的可行替代品。本工作的重点是将这些聚合物微球选择性沉积在细间距键合垫上。使用这种微球的一个重要优点是,除了金属的使用量相对较低外,它们的机械性能可以根据应用的需要进行定制。最初的试验是使用9.8 μm直径的聚合物颗粒,在表面涂上化学镍,然后在表面镀上一层浸金。为了有选择地将这些粒子沉积到ASIC设备的键合板上,需要对它们进行充电。将颗粒浸入酸性水溶液中,在去离子水中冲洗后,将它们转移到合适的溶剂中。该过程导致颗粒表面产生净正电荷,从而允许颗粒使用电泳技术沉积,即在颗粒悬浮液上施加电场以驱动颗粒沉积在基板上。用电子显微镜研究了这种浸泡在酸性水溶液中对颗粒表面金属层的影响。研究了颗粒在均匀的镀金硅衬底上的电泳沉积速率,以确定化学处理时间对颗粒沉积的影响。随后,同样的技术被用于将颗粒直接沉积在ASIC设备的键合板上。在电泳装置中使用ASIC作为阴极,颗粒能够选择性地沉积在间距为170 μm的键垫上。
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Metal-coated mono-sized polymer core particles for fine pitch flip-chip interconnects
The increasing demand for fine pitch flip-chip interconnection has led to significant interest in alternatives to the widely used solder joints. The use of mono-sized metal coated polymer based micro-spheres is emerging as a method to achieve more robust and reliable interconnects for ball grid arrays and chip scale packages. This paper presents results from a collaborative research project investigating whether polymer cored interconnects are a viable replacement for such ultra-fine pitch solder joints. The focus of this work centres on the selective deposition of these polymer microspheres onto fine pitch bond pads. An important advantage of using such microspheres is that their mechanical properties can be tailored to suit the needs of the application, in addition to the relatively low usage of metals. Initial trials have been carried out using 9.8 μm diameter polymer particles which have been coated with electroless nickel and then an immersion gold surface layer. In order to selectively deposit these particles on to the bond pads of an ASIC device they were required to be charged. The particles were immersed in an aqueous acid solution and after rinsing in deionised water they were then transferred to a suitable solvent. This process resulted in a net positive charge on the particle surface which allowed the particles to be deposited using electrophoretic techniques i.e. an electric field was applied to the particle suspension to drive the particles to deposit on the substrate. The effect of this immersion in the aqueous acid solution on the surface metal layer of the particles has been studied using electron microscopy. The rate of electrophoretic deposition of the particles onto a homogeneous gold coated silicon substrate was studied to determine how the length of chemical treatment affects the particle deposition. Following from this the same technique was then used to deposit the particles directly on to the bond pads of an ASIC device. Using the ASIC as the cathode in the electrophoretic setup the particles were able to be selectively deposited onto bond pads with a pitch of 170 μm.
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Parasitic electrical and electromagnetic effects Heat management Passive electronic components Interconnection technology Reliability and maintainability
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