气桥场极板增强功率AlGaN/GaN hemt击穿电压

G. Xie, E. Xu, Junmin Lee, N. Hashemi, F. Y. Fu, Bo Zhang, W. Ng
{"title":"气桥场极板增强功率AlGaN/GaN hemt击穿电压","authors":"G. Xie, E. Xu, Junmin Lee, N. Hashemi, F. Y. Fu, Bo Zhang, W. Ng","doi":"10.1109/ISPSD.2012.6229090","DOIUrl":null,"url":null,"abstract":"This paper presents a breakdown voltage enhancement technique for power AlGaN/GaN HEMTs by using novel Air-bridge Field Plate (AFP). The device features a metal field plate that jumps from the source over the gate region and lands between gate and drain. Simulation results show that the HEMTs with Air-bridge Field Plate can provide a new degree of freedom to modulate the device surface electric field. In a device with gate to drain distance of 6 µm, gate length of 0.8 µm, two times higher forward blocking voltage of 450 V was obtained at VGS = −5 V when compared to a device with an optimized conventional field plate device (240 V) for a given process.","PeriodicalId":6363,"journal":{"name":"2011 IEEE International Conference of Electron Devices and Solid-State Circuits","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2012-06-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":"{\"title\":\"Breakdown voltage enhancement for power AlGaN/GaN HEMTs with Air-bridge Field Plate\",\"authors\":\"G. Xie, E. Xu, Junmin Lee, N. Hashemi, F. Y. Fu, Bo Zhang, W. Ng\",\"doi\":\"10.1109/ISPSD.2012.6229090\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper presents a breakdown voltage enhancement technique for power AlGaN/GaN HEMTs by using novel Air-bridge Field Plate (AFP). The device features a metal field plate that jumps from the source over the gate region and lands between gate and drain. Simulation results show that the HEMTs with Air-bridge Field Plate can provide a new degree of freedom to modulate the device surface electric field. In a device with gate to drain distance of 6 µm, gate length of 0.8 µm, two times higher forward blocking voltage of 450 V was obtained at VGS = −5 V when compared to a device with an optimized conventional field plate device (240 V) for a given process.\",\"PeriodicalId\":6363,\"journal\":{\"name\":\"2011 IEEE International Conference of Electron Devices and Solid-State Circuits\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2012-06-03\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"4\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2011 IEEE International Conference of Electron Devices and Solid-State Circuits\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ISPSD.2012.6229090\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2011 IEEE International Conference of Electron Devices and Solid-State Circuits","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISPSD.2012.6229090","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 4

摘要

提出了一种新型气桥场极板(AFP)增强功率AlGaN/GaN hemt击穿电压的技术。该装置具有从源跃过栅极区域并落在栅极和漏极之间的金属场板。仿真结果表明,带气桥场板的hemt可以为器件表面电场的调制提供新的自由度。在给定工艺条件下,栅极到漏极距离为6µm,栅极长度为0.8µm的器件在VGS =−5 V时获得450 V的正向阻断电压,比采用优化的传统场极板器件(240 V)的器件高两倍。
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Breakdown voltage enhancement for power AlGaN/GaN HEMTs with Air-bridge Field Plate
This paper presents a breakdown voltage enhancement technique for power AlGaN/GaN HEMTs by using novel Air-bridge Field Plate (AFP). The device features a metal field plate that jumps from the source over the gate region and lands between gate and drain. Simulation results show that the HEMTs with Air-bridge Field Plate can provide a new degree of freedom to modulate the device surface electric field. In a device with gate to drain distance of 6 µm, gate length of 0.8 µm, two times higher forward blocking voltage of 450 V was obtained at VGS = −5 V when compared to a device with an optimized conventional field plate device (240 V) for a given process.
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